2004
DOI: 10.1016/j.tsf.2003.11.012
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Comparison of amorphous/crystalline heterojunction solar cells based on n- and p-type crystalline silicon

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Cited by 42 publications
(19 citation statements)
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“…Further work is needed to find out whether there are fundamental reasons, apart from those mentioned in section 3, for the observed deviation in results on p-and n-type wafers [124,125]. We note here that by using an epitaxially grown n-type emitter passivated with a-Si:H, IBM, USA demonstrated solar cells on p-type FZ wafers with efficiencies in excess of 20% [126].…”
Section: Device Resultsmentioning
confidence: 96%
“…Further work is needed to find out whether there are fundamental reasons, apart from those mentioned in section 3, for the observed deviation in results on p-and n-type wafers [124,125]. We note here that by using an epitaxially grown n-type emitter passivated with a-Si:H, IBM, USA demonstrated solar cells on p-type FZ wafers with efficiencies in excess of 20% [126].…”
Section: Device Resultsmentioning
confidence: 96%
“…This will result in a different carrier transport in n-and p-type heterojunction solar cells due to the different band structure seen by minority carriers [24], [25]. Under device-operating conditions (similar to a high-bias regime), however, the a-Si:H/c-Si interface defect density was shown to be the limiting factor for solar cell performance [3], [23]- [26]. Suppressing the defect states at the interfaces is indeed the key to efficient transport and high V oc and FF values, whereas band structures may play only a minor role [25].…”
Section: A Effect Of the Wafer Doping Type And Emitter Position On Smentioning
confidence: 99%
“…3. Table 2 shows the experimental data of heterojunction solar cells derived from the illuminated current-voltage characteristics, also established by Tucci et al [10]. The different photovoltaic parameters observed for different values of D i in this study are summarized in Table 2.…”
Section: Effect Of the Interface State Density On The Photovoltaic Pamentioning
confidence: 69%
“…Figure 2 plots the EQE calculated for different values of interface state density D i . The value of recombination veloc- [10] are presented in the same figure In our study, we have used the experimentally measured front reflectance of ZnO R(λ) as a dotted line [21].…”
Section: Effect Of the Interface State Density On The Eqementioning
confidence: 99%
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