2011
DOI: 10.15669/pnst.2.762
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Comparison between Energy Straggling Strategy and Continuous Slowing Down Approximation in Monte Carlo Simulation of Secondary Electron Emission of Insulating Materials

Abstract: Secondary electrons are commonly used for imaging in scanning electron microscopes, with applications ranging from secondary electron doping contrast in p-n junctions, line-width measurement in critical-dimension scanning electron microscopy and dimensional parameters evaluation in the production of masks and wafers in the semiconductor industry, to the study of biological samples. This paper describes the secondary electron emission yield calculated using two different Monte Carlo approaches. In the first, ba… Show more

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Cited by 7 publications
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“…Four different types of events of the interaction between primary electrons and the matter can be separated [15]. They are elastic scattering and three types of inelastic scattering-generation of secondary electrons, plasmons or excitation (which lead to generation of high energy photons or Auger electrons).…”
Section: Fig 4 3d Afm Image Of Structure Obtained By Deber Methods Dmentioning
confidence: 99%
“…Four different types of events of the interaction between primary electrons and the matter can be separated [15]. They are elastic scattering and three types of inelastic scattering-generation of secondary electrons, plasmons or excitation (which lead to generation of high energy photons or Auger electrons).…”
Section: Fig 4 3d Afm Image Of Structure Obtained By Deber Methods Dmentioning
confidence: 99%