Comparative study of the laser damage threshold and optical characteristics of Ta₂O₅-SiO₂multilayers deposited using various methods

Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substrate Biasing: Thin Films for High-Reflective Mirrors

“…Conventionally, high-reflective (HR) coatings are mainly prepared using PVD techniques. 54−59 Several dielectric material combinations have been used for HR coatings such as TiO 2 /SiO 2 , 60,61 ZrO 2 /SiO 2 , 60,62,63 Nb 2 O 5 /SiO 2 , 60 Al 2 O 3 / SiO 2 , 64,65 Ta 2 O 3 /SiO 2 , 60,66,67 Ta 2 O 3 /Al 2 O 3 , 58 HfO 2 / SiO 2 , 54,59,68,69 and HfO 2 /Al 2 O 3 . 58 The 2020 SPIE laser damage symposium evaluated the laser-induced damage threshold (LIDT) of mirrors (deposited with five different PVD methods) at 532 nm wavelength with nanosecond pulses.…”

“…Also, absorption losses in these coatings can increase with nonstoichiometric defects such as oxygen vacancies or electronic defects. , Hence, high-power laser applications require coatings with low absorption and minimal nodular defects. Conventionally, high-reflective (HR) coatings are mainly prepared using PVD techniques. − Several dielectric material combinations have been used for HR coatings such as TiO 2 /SiO 2 , , ZrO 2 /SiO 2 , ,, Nb 2 O 5 /SiO 2 , Al 2 O 3 /SiO 2 , , Ta 2 O 3 /SiO 2 , ,, Ta 2 O 3 /Al 2 O 3 , HfO 2 /SiO 2 , ,,, and HfO 2 /Al 2 O 3 . The 2020 SPIE laser damage symposium evaluated the laser-induced damage threshold (LIDT) of mirrors (deposited with five different PVD methods) at 532 nm wavelength with nanosecond pulses.…”