“…Several techniques were tried to deposit Zn x –1 Cd x O layers, including pulsed laser sputtering, molecular beam epitaxy (MBE), a dc reactive magnetron sputtering method, spray pyrolysis technique, , and others. Obviously, the growth method has an impact on the Cd content, structural and optoelectronic characteristics of the obtained ternary alloy. , However, the quality of the films prepared by many methods was unsatisfactory due to the coexistence of multiphase and polycrystalline states . The structure of wurtzite is the most stable for ZnO and therefore the most common, while CdO has a cubic-type structure. , Also, the difference in crystal structures limits the Cd solubility in ZnO .…”