Search citation statements
Paper Sections
Citation Types
Year Published
Publication Types
Relationship
Authors
Journals
Plasmonic optical nanolithography using extraordinary optical transmission through a metallic nanohole mask has been actively applied to the high-resolution fabrication of nanostructures over a large area. Although there have been studies on improving the nanostructure fabrication performance in optical nanolithography, such as on adjustable external gap spacing, additional performance enhancement is required for practical applications and commercialization of large-area and high-resolution nanostructure array fabrication techniques. In this study, we design and apply a plasmonic bull’s eye nanostructured meta-mask to enhance the performance of optical nanolithography. Through simulation results and experimental verification, it is confirmed that advanced optical nanolithography using the bull’s eye nanostructured meta-mask has several merits compared to conventional Talbot lithography using nanoholes: (1) Optical nanolithography using the bull’s eye nanostructured meta-mask effectively fabricates nanopillar arrays even at a shorter exposure time than conventional optical lithography using nanoholes. (2) It is possible to create a large-area nanopillar array with various nanopillar diameters by exposure time control in optical nanolithography using the bull’s eye meta-mask. (3) Using water or objective immersion oil to increase the refractive index of the contact medium, light can be focused on smaller sizes, and large-area nanopillar arrays with smaller nanopillar diameters are established. With the upgradation of hardware for large-area fabrication, application of immersion media supplying techniques, and additional studies to establish complex nanostructures, optical nanolithography using the bull’s eye nanostructured meta-mask is an efficient modality to produce various nanostructure-based devices.
Plasmonic optical nanolithography using extraordinary optical transmission through a metallic nanohole mask has been actively applied to the high-resolution fabrication of nanostructures over a large area. Although there have been studies on improving the nanostructure fabrication performance in optical nanolithography, such as on adjustable external gap spacing, additional performance enhancement is required for practical applications and commercialization of large-area and high-resolution nanostructure array fabrication techniques. In this study, we design and apply a plasmonic bull’s eye nanostructured meta-mask to enhance the performance of optical nanolithography. Through simulation results and experimental verification, it is confirmed that advanced optical nanolithography using the bull’s eye nanostructured meta-mask has several merits compared to conventional Talbot lithography using nanoholes: (1) Optical nanolithography using the bull’s eye nanostructured meta-mask effectively fabricates nanopillar arrays even at a shorter exposure time than conventional optical lithography using nanoholes. (2) It is possible to create a large-area nanopillar array with various nanopillar diameters by exposure time control in optical nanolithography using the bull’s eye meta-mask. (3) Using water or objective immersion oil to increase the refractive index of the contact medium, light can be focused on smaller sizes, and large-area nanopillar arrays with smaller nanopillar diameters are established. With the upgradation of hardware for large-area fabrication, application of immersion media supplying techniques, and additional studies to establish complex nanostructures, optical nanolithography using the bull’s eye nanostructured meta-mask is an efficient modality to produce various nanostructure-based devices.
Metallic nanowires have been utilized as a platform for propagating surface plasmon (SPs) fields. To be exploited for applications such as plasmonic circuits, manipulation of localized field propagating pattern is also important. In this study, we calculated the field distributions of localized surface plasmons (LSPs) on the specifically shaped nanostructures and explored the feasibility of manipulating LSP fields. Specifically, plasmonic fields were calculated at different wavelengths for a nanoscale rod array (I-shaped), an array connected with two nanoscale rods at right angles (T-shaped), and an array with three nanoscale rods at 120° to each other (Y-shaped). Three different types of nanostructures are suggested to manipulate the positions of LSP fields collaborating with adjustment of wavelength, polarization, and incident orientation of light source. The results of this study are important not only for the understanding of the wavelength-dependent surface plasmon field localization mechanism but also for the applicability of swept source-based plasmonic techniques or designing a plasmonic circuit.
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.
customersupport@researchsolutions.com
10624 S. Eastern Ave., Ste. A-614
Henderson, NV 89052, USA
Copyright © 2024 scite LLC. All rights reserved.
Made with 💙 for researchers
Part of the Research Solutions Family.