1984
DOI: 10.1103/physrevlett.53.1958
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Comparative Study of Defects in Semiconductors by Electrolyte Electroreflectance and Spectroscopic Ellipsometry

Abstract: It is shown that, because of the electrostriction and polarization of defects by the modulating electric field, electroreflectance spectra are more affected by defects than are third-derivative spectra from ellipsometry data. The theory of electroreflectance is generalized to include these effects. Plasticity and long-range strains are shown to lead to a first-derivative line shape and polarizable defects to a second-derivative line shape. For defect-rich samples these new terms dominate the usual third-deriva… Show more

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Cited by 61 publications
(3 citation statements)
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“…These discrepancies have been thought to have resulted from a Burstein-Moss shift due to impurities doping, 1 I or from the effect of nonstoichiometry due to the native defects. 8 In a previous work we studied the temperature-dependent energy gaps of CulnS 2 by the surface barrier electroreflectance (SBER) method. 9 The observation of positive temperature coefficients below 120 K indicates that the band-gap shift is related to the reduction of d-leve1 contributions in the upper valence band due to thermal expansion and the competition of thermal expansion with the electron-phonon interaction.…”
Section: ! Introductionmentioning
confidence: 99%
“…These discrepancies have been thought to have resulted from a Burstein-Moss shift due to impurities doping, 1 I or from the effect of nonstoichiometry due to the native defects. 8 In a previous work we studied the temperature-dependent energy gaps of CulnS 2 by the surface barrier electroreflectance (SBER) method. 9 The observation of positive temperature coefficients below 120 K indicates that the band-gap shift is related to the reduction of d-leve1 contributions in the upper valence band due to thermal expansion and the competition of thermal expansion with the electron-phonon interaction.…”
Section: ! Introductionmentioning
confidence: 99%
“…= W~RZTBRSR&&,B (38) where RI, R,, R , and R , are the reflectivities from mirrors 1, 2, 3 and 4, respectively, R, is the reflectivity from the beam splitter, TB is the transmission of the beam splitter, RdFtA and RdelB are voltage response functions of detectors A and B, respectively, and R, is the reflectivity of the sample under test. R, measured over the E , transition energy range provides the desired reflectance data.…”
Section: Obtaining Sample Reflectivitymentioning
confidence: 99%
“…)/(38) a cancellation of I,, R I and R , yieldsTo obtain R,, mirror 4 is placed at the sample location and detector B is moved to collect the beam to obtain a mirror calibration, as shown in figure26(b). For the mirror calibration the ratio of J&lB/&efA becomes…”
mentioning
confidence: 99%