Comparative study of copper deposits obtained by thermal decomposition and photo-assisted chemical vapour deposition of 3-diketonate complexes

Abstract

The use of the Ba(thd):! precursor, in the elaboration of thin superconductor layers by OMCVD, is not satisfactory because its volatility decreases when it is kept at the sublimation temperature during the deposition. In order to avoid this problem, fluorine complexes, such as Ba(hfa)2 can be used. Nevertheless, its thermal decomposition at high temperature induces the presence of baryum fluoride, which is harmful for obtaining superconductor films with high critical temperature. This work is aiming to study the elaboration of superconducting deposits at low temperature and without fluorine. We have undertaken a program based on a photo-assisted thermal decomposition of various organometallic compounds, which are used as precursors of superconductor layers. Photonic assistance enables to obtain copper deposits at 150°C. The results of the photo-assisted decomposition of C~( t h d )~and C~( h f a )~ are presented here.

Photofragmentation Pathways and Photodeposition of Nanoparticles from a Gas Phase Copper-Containing Precursor

“…Copper has been photodeposited in the form of nanoparticles and thin films using UV and visible light excitation from a small number of precursors . The bulk of the research on copper precursors was done on Cu(hfac)(TMVS) (hfac = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionato; TMVS = trimethylsilylethene), − Cu(hfac) 2 , − and Cu(TMHD) 2 . − Other copper precursors that have been studied include Cu(hfac)(COD) (COD = 1,5-cyclooctadiene), Cu(hfac)(MHY) (MHY = 2-methyl-1-hexene-3-yne), Cu(acac) 2 (acac = 2,4-pentanedionato), CuCp(Et 3 P) (Cp = cyclopentadienyl; Et 3 P = triethylphosphine), Cu(tfa) 2 (tfa = 1,1,1-trifluoro-5,5-dimethyl-2,4-hexanedionato), and Cu(baa) 2 (baa = tert -butylacetoacetato) …”

VUV-Stimulated MO CVD Processes of Copper Layer Deposition

“…Permanent interest to the deposition of thin copper films stimulates the development of both the precursor chemistry and the processes of their deposition. Both classical copper (II) complexes and copper (I) compounds are used as precursors (3,4). In a number of works (3,5,6), UV-stimulation is used to decrease the process temperature.…”

“…Both classical copper (II) complexes and copper (I) compounds are used as precursors (3,4). In a number of works (3,5,6), UV-stimulation is used to decrease the process temperature. The influence of UV radiation on the mechanism and morphology of the deposited copper films was studied in Ref.…”