2012
DOI: 10.1007/s10854-012-0696-7
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Comparative studies on structural, optoelectronic and electrical properties of SILAR grown PbS thin films from acidic, neutral and alkaline cationic reaction bath

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Cited by 15 publications
(15 citation statements)
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“…The microstrain developed in the film decreases with an increase in annealing temperature. This may be explained as the increase in grain size with an increase in annealing temperature may decrease the surface area of each grain and thereby a reduction in force per unit area between grains and consequently pave the way for strain relaxation [52].…”
Section: Resultsmentioning
confidence: 99%
“…The microstrain developed in the film decreases with an increase in annealing temperature. This may be explained as the increase in grain size with an increase in annealing temperature may decrease the surface area of each grain and thereby a reduction in force per unit area between grains and consequently pave the way for strain relaxation [52].…”
Section: Resultsmentioning
confidence: 99%
“…The intensity of XRD peaks are seen to be much larger for 0.50M (LAc) than the corresponding peaks of the other two samples which implies that more number of planes of a particular {hkl} family took part in the process of diffraction at this concentration of Pb(CH 3 COO) 2. .Preferred orientation changes from (200) in 0.50M(LAc) to (111) for 0.75M (LAc) and 1.00M (LAc) indicating three dimensional growth of the films at higher concentration of Pb(CH 3 COO) 2 . The XRD pattern of 0.75M(LAc) and 1.00M(LAc) shows an additional peak (marked as # in Fig 1) corresponding to the (101) plane of elemental Pb (ICDD card No.…”
Section: Resultsmentioning
confidence: 96%
“…[8][9][10][11][12] are calculated using various proportions of screw and edge dislocations. The linear plots between (ΔK) 2 and K 2 C hkl (using eq.7) for the best fit are shown in the Fig 4. It has been observed that MWH plots give better fitting than WH plot . In all the films, the best MWH fitting is obtained when dislocations are considered to be completely of edge type.…”
Section: Resultsmentioning
confidence: 99%
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“…Precursor concentrations of 20 mmol L À1 were selected as representative of those typically used for sensitizing large area mesoporous oxides. 26,28,30,31,[58][59][60] The SILAR procedure was carried out in a nitrogen-purged glove box. Samples were characterized with tapping mode atomic force microscopy (AFM) in air, with a lateral resolution dened by the 7 nm AFM tip radius.…”
Section: Resultsmentioning
confidence: 99%