2021
DOI: 10.1016/j.scitotenv.2020.142696
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Comparative removal of two antibiotic resistant bacteria and genes by the simultaneous use of chlorine and UV irradiation (UV/chlorine): Influence of free radicals on gene degradation

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Cited by 52 publications
(21 citation statements)
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“…HO • has been demonstrated to play an important role in the inactivation of tetracycline-resistant Escherichia coli and in the removal of antibiotic resistance genes (ARGs) ( e.g. , sul 1 and blt ) by UV/chlorine treatment. Additionally, HO • promotes the elimination of extracellular deoxyribonucleic acids (eDNA) in the UV/H 2 O 2 process and in the natural organic matter photosensitized system. , However, HO • is nonselective and results in rapid consumption by cellular components before contacting intracellular DNA (iDNA). , In contrast, RCS (Cl • , Cl 2 •– , and ClO • ) selectively react with compounds containing electron-rich groups, such as amino acids, pyrimidines, and purines. In addition, the concentrations of RCS, especially ClO • , are higher than that of HO • in the UV/chlorine process .…”
Section: Introductionmentioning
confidence: 99%
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“…HO • has been demonstrated to play an important role in the inactivation of tetracycline-resistant Escherichia coli and in the removal of antibiotic resistance genes (ARGs) ( e.g. , sul 1 and blt ) by UV/chlorine treatment. Additionally, HO • promotes the elimination of extracellular deoxyribonucleic acids (eDNA) in the UV/H 2 O 2 process and in the natural organic matter photosensitized system. , However, HO • is nonselective and results in rapid consumption by cellular components before contacting intracellular DNA (iDNA). , In contrast, RCS (Cl • , Cl 2 •– , and ClO • ) selectively react with compounds containing electron-rich groups, such as amino acids, pyrimidines, and purines. In addition, the concentrations of RCS, especially ClO • , are higher than that of HO • in the UV/chlorine process .…”
Section: Introductionmentioning
confidence: 99%
“…Liu et al. (2020) and Phattarapattamawong et al (2021) reported that HO • plays a primary role in the degradation of tet M, bla TEM , and sul 1 genes, while RCS play minor roles. However, Zhang et al (2019) reported that RCS play a critical role in the degradation of sul 1 and intI 1 genes in the UV/chlorine process at a chlorine dosage of 20 mg/L . Thus, the roles of RCS in UV/chlorine disinfection need further investigation.…”
Section: Introductionmentioning
confidence: 99%
“…The UV-C/FC process was more effective than UV-C and chlorination as a standalone process in the removal of tet M and bla Tem genes from aqueous solutions. 132 More specifically, the UV-C/FC process (9.03 mW cm −2 ) reduced the tet M and bla Tem genes by 0.98–3.20 log and 1.28–3.36 log, respectively, as the chlorine dose was increased from 0.5 to 20.0 mg L −1 . However, when more realistic conditions were investigated (real secondary-treated wastewater and 0.91 mW cm −2 UV-C dose), the target ARGs (belonging to phenicol, tetracycline, macrolide, fluoroquinolone, oxazolidinone, and penam classes of antibiotics) were found to be enriched by all the three disinfection treatments (UV-C, chlorination, and UV-C/FC), the most prominent increase being observed for UV-C/FC.…”
Section: Tertiary Treatment Of Urban Wastewater By Hp-aopsmentioning
confidence: 98%
“…However, the specific roles of radicals in UV/chlorine for disinfection are debated. Some studies reported that HO· plays the predominant role in the inactivation of bacteriophage MS2 and the degradation of ARGs ( tet M and bla Tem) in Escherichia coli , while RCS play minor roles. , The others reported that RCS play obvious roles in the removal of ARGs ( sul 1) in Pseudomonas HLS-6 and the inactivation of Pseudomonas aeruginosa . , Currently, the studies on UV/chlorine disinfection are very limited. The roles and mechanisms of RCS for the abatement of microbial contaminants in the UV/chlorine process are still largely unknown, such as the attacking sites and specific contributions, which need further study.…”
Section: Abatement Of Contaminants By the Uv/chlorine Processmentioning
confidence: 99%