2013
DOI: 10.1016/j.jcis.2012.09.014
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Comparative investigation of zirconium oxide (ZrO2) nano and microstructures for structural, optical and photocatalytic properties

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Cited by 123 publications
(47 citation statements)
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“…This emission band can be attributed to electron transitions in intrinsic defects of zirconia nanostructures, which is similar to the literatures. 30 Scanning electron microscope was applied to consider the influences of dosage of TEPA, solvent, and reaction time on the shape of the zirconium dioxide nanostructures. As mentioned, novelty of this work compared to other performed reports is the usage of TEPA as a new precipitator to prepare of zirconium dioxide, without applying any surfactant and capping agent.…”
Section: Resultsmentioning
confidence: 99%
“…This emission band can be attributed to electron transitions in intrinsic defects of zirconia nanostructures, which is similar to the literatures. 30 Scanning electron microscope was applied to consider the influences of dosage of TEPA, solvent, and reaction time on the shape of the zirconium dioxide nanostructures. As mentioned, novelty of this work compared to other performed reports is the usage of TEPA as a new precipitator to prepare of zirconium dioxide, without applying any surfactant and capping agent.…”
Section: Resultsmentioning
confidence: 99%
“…The PL and especially PA of zirconia films have been seldom reported [5,6], although PL and PA have been observed in a ZrO 2 sol and nanoparticle systems [7][8][9][10]. It has been proposed for these systems that PL centers are defect centers related to oxygen vacancies and interstitial defects.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, many oxide materials such as Co 3 O 4 nanocubes, ZrO 2 nanospheres, MgO nanoflakes etc. have also been prepared by a rapid MCM process [21][22][23]. Nanosized particles prepared by using the MCM approach are expected to have a larger surface area, smaller particle size, and greater stability than those obtained by other methods.…”
Section: Introductionmentioning
confidence: 99%