2017
DOI: 10.1080/10584587.2017.1337466
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Comparative analysis of the structural and physical properties of magnetron Co-sputtered Ag-doped and Si-doped hydroxyapatite coatings on titanium substrates

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“…Morphologically, the surface (Figure 2) and cross-sectional (Figure 1) results, in conjunction with the XRD (Figure 3) and RHEED (Figures 4 and 5) analysis demonstrated clear trends regarding crystallisation of the films, in addition to increasing silicon content, which is in good agreement with Agyapong et al [29] and Wang et al [46] The films showed an increase in thickness with increasing power density applied to the Si target confirmed via TEM (Figure 1), which is to be expected since increasing the power density causes an increase in sputtering yield [47]. Furthermore, as is expected with magnetron sputtering deposition [30], the film exhibited good step coverage, as seen in the SEM (Figure 2) and roughness measurements (Figure 8).…”
Section: Composition and Topographical Analysissupporting
confidence: 87%
“…Morphologically, the surface (Figure 2) and cross-sectional (Figure 1) results, in conjunction with the XRD (Figure 3) and RHEED (Figures 4 and 5) analysis demonstrated clear trends regarding crystallisation of the films, in addition to increasing silicon content, which is in good agreement with Agyapong et al [29] and Wang et al [46] The films showed an increase in thickness with increasing power density applied to the Si target confirmed via TEM (Figure 1), which is to be expected since increasing the power density causes an increase in sputtering yield [47]. Furthermore, as is expected with magnetron sputtering deposition [30], the film exhibited good step coverage, as seen in the SEM (Figure 2) and roughness measurements (Figure 8).…”
Section: Composition and Topographical Analysissupporting
confidence: 87%