2005
DOI: 10.1002/pssa.200461618
|View full text |Cite
|
Sign up to set email alerts
|

Comparative analysis of hot‐electron transport in AlGaN/GaN and AlGaN/AlN/GaN 2DEG channels

Abstract: Nanosecond‐pulsed current–voltage measurements were used to study hot‐electron transport in undoped AlGaN/GaN and AlGaN/AlN/GaN two‐dimensional electron gas channels biased up to 200 kV/cm. Voltage pulses of 1 ns were applied in order to minimize channel heating. The current saturated at 100 kV/cm in the AlN‐interbarrier‐contained structures; the estimated saturated drift velocity was about 1.1 × 107 cm/s. No saturation of the current was observed in AlGaN/GaN channels in the field range below 200 kV/cm. Monte… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

3
26
0

Year Published

2005
2005
2017
2017

Publication Types

Select...
4
1
1

Relationship

3
3

Authors

Journals

citations
Cited by 24 publications
(29 citation statements)
references
References 10 publications
3
26
0
Order By: Relevance
“…We think that the random piezoelectric fields and defect density are reduced when the alloy composition is lattice matched with the GaN layer in the Al 0.82 In 0.18 N/AlN/GaN structure. A similar conclusion follows from a comparison of the experimental results for the LM AlInN/AlN/GaN 2DEG channel with those for strained AlGaN/GaN [10], AlGaN/GaN/AlN/GaN [11], and silicon-doped GaN [12] (see Fig. 4).…”
Section: Samplessupporting
confidence: 72%
“…We think that the random piezoelectric fields and defect density are reduced when the alloy composition is lattice matched with the GaN layer in the Al 0.82 In 0.18 N/AlN/GaN structure. A similar conclusion follows from a comparison of the experimental results for the LM AlInN/AlN/GaN 2DEG channel with those for strained AlGaN/GaN [10], AlGaN/GaN/AlN/GaN [11], and silicon-doped GaN [12] (see Fig. 4).…”
Section: Samplessupporting
confidence: 72%
“…scattering does not play a significant role in camelback channels. Also, the maximum attained drift velocity in the alloy-free coupled channel exceeds that in a standard AlN-spacer single GaN-based 2DEG channel by 50% [4]. Despite the fact that the velocity in the coupled channel is twice lower than the maximum drift velocity measured in the single GaN 2DEG channel [7], for similar electron densities (6×10 12 cm -2 ) the velocity in the coupled channel is 50% higher than in the single GaN 2DEG channel [9].…”
Section: Drift Velocity Optimal Conditions For Hfet Frequency Performentioning
confidence: 78%
“…4. Room temperature dependence of the drift velocity on the electric field for the alloy-free coupled {GaN/ AlN/GaN} channels (L = 5 μm, blue triangles; L = 2 μm, stars) and single AlN-spacer GaN-based 2DEG channel (L = 5 μm, diamonds [4]). Voltage pulse duration is 2 ns.…”
Section: Drift Velocity Optimal Conditions For Hfet Frequency Performentioning
confidence: 99%
See 2 more Smart Citations