2014
DOI: 10.1103/physrevstab.17.120701
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Compact x-ray source based on burst-mode inverse Compton scattering at 100 kHz

Abstract: A design for a compact x-ray light source (CXLS) with flux and brilliance orders of magnitude beyond existing laboratory scale sources is presented. The source is based on inverse Compton scattering of a high brightness electron bunch on a picosecond laser pulse. The accelerator is a novel high-efficiency standingwave linac and rf photoinjector powered by a single ultrastable rf transmitter at X-band rf frequency. The high efficiency permits operation at repetition rates up to 1 kHz, which is further boosted t… Show more

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Cited by 115 publications
(69 citation statements)
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“…For systematic scanning of bookbindings, ample availability of synchrotron-order X-ray intensity is required. Several 'table-top' initiatives have been proposed, of which a set-up based on inverse Compton scattering between a relativistic electron and a laser pulse now seems to be technically feasible [19]. Provided sufficient funding will become available, the intensity would approach that of a bending magnet synchrotron beam and surpass it in the high-energy range relevant for elemental analysis.…”
Section: Discussionmentioning
confidence: 99%
“…For systematic scanning of bookbindings, ample availability of synchrotron-order X-ray intensity is required. Several 'table-top' initiatives have been proposed, of which a set-up based on inverse Compton scattering between a relativistic electron and a laser pulse now seems to be technically feasible [19]. Provided sufficient funding will become available, the intensity would approach that of a bending magnet synchrotron beam and surpass it in the high-energy range relevant for elemental analysis.…”
Section: Discussionmentioning
confidence: 99%
“…Near-IR thin-disk lasers also proved their ability to generate high average power short pulses, which are suitable for laser produced plasma-based (LPP) [20], free electron laser-based (FEL) [21,22], or inverse Compton scattering-based (ICS) [23] extreme UV radiation sources. It helps, for example, to construct new stations for semiconductor lithography at 13.5 nm or 6.7 nm and to support evolution in electronics.…”
Section: Introductionmentioning
confidence: 99%
“…The normalized transverse emittance in the y-dimension is ϵ y ¼ 10 nm-rad. Simulations to produce these beam parameters are described in [19], and the accelerator equipment is described in [20]. The electron beam properties at the input of the EEX line are summarized in Table V Table VI.…”
Section: Aberration Corrected Performancementioning
confidence: 99%