Compact Coating of Tantalum on Tungsten Prepared by Molten Salt Electrodeposition

Abstract

Attempts to prepare tantalum coating on tungsten have been performed in 55 mol%LiF-35 mol%NaF-10 mol%CaF 2 melt containing K 2 TaF 7 . Electrolytic deposition of tantalum was carried out by galvanostatic polarization. A conproportionation reaction also occurred that interfered with the electrodeposition and resulted in decrease in current efficiency. However, the product of this reaction was soluble, which diffused away from the electrode without contaminating the deposit. Hence, a compact electrodeposited tantalum coating was obtained on tungsten substrate. An excellent interface was possible when coating was performed in the melt containing 2 mol% K 2 TaF 7 .

Refractory metal coatings on titanium to improve corrosion resistance in nitric acid medium

“…Niobium has been deposited on Ti by sputtering technique and plasma immersion ion implantation for improving corrosion resistance for biomedical and dental implant applications [8]. Among other techniques, Mehmood et al [9] and Cardarelli et al [10] deposited tantalum by molten salt electrodeposition, while Koivuluoto et al [11] deposited by cold spraying technique. Chemical vapour deposition (CVD) technique is the most commonly used technique and Tantaline Inc, Massachusetts, USA has made corrosion-resistant Ta coating on 316 L SS by CVD technique [12,13].…”

Deposition of Nanocrystalline Zinc-Nickel Alloys by D.C. Plating in Additive Free Chloride Bath

“…Both aqueous 1) and non aqueous 2,3) solutions have been employed for the purpose. However, the aqueous solutions have the special advantage of room temperature operation and are, therefore, preferred for large scale applications.…”