2020
DOI: 10.1021/jacs.0c10713
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Common Background Signals in Voltammograms of Crystalline Silicon Electrodes are Reversible Silica–Silicon Redox Chemistry at Highly Conductive Surface Sites

Abstract: The electrochemical reduction of bulk silica, due to its high electrical resistance, is of limited viability, namely, requiring temperatures in excess of 850 °C. By means of electrochemical and electrical measurements in atomic force microscopy, we demonstrate that at a buried interface, where silica has grown on highly conductive Si(110) crystal facets, the silica–silicon conversion becomes reversible at room temperature and accessible within a narrow potential window. We conclude that parasitic signals commo… Show more

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Cited by 17 publications
(19 citation statements)
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“…It also suggests that the interfacial band bending situation can change significantly, even when there is no chemical bond formed at the junction. Previously, current-rectifying I–V curves have been observed for Cu 2 O cubes and octahedra deposited on 1,8-nonadiyne-treated amorphous silicon substrate, so the silicon substrate does not have a well-defined crystal plane. Next, the combination of a Cu 2 O rhombic dodecahedron on a Si {100} wafer did not produce any current (Figure d). A small current of 1 nA was observed at 3 V under light illumination.…”
Section: Results and Discussionmentioning
confidence: 87%
“…It also suggests that the interfacial band bending situation can change significantly, even when there is no chemical bond formed at the junction. Previously, current-rectifying I–V curves have been observed for Cu 2 O cubes and octahedra deposited on 1,8-nonadiyne-treated amorphous silicon substrate, so the silicon substrate does not have a well-defined crystal plane. Next, the combination of a Cu 2 O rhombic dodecahedron on a Si {100} wafer did not produce any current (Figure d). A small current of 1 nA was observed at 3 V under light illumination.…”
Section: Results and Discussionmentioning
confidence: 87%
“…The effect of traces of SiO x on the electrochemical and electrical properties of Si is well-documented. For example, traces of oxide affect the thermodynamics of electrochemical redox reactions , as well as the current–voltage response of M–S junctions . We now measure the effect of oxide and the protective GO x layer on the electrical response of a metal–Si junction.…”
Section: Resultsmentioning
confidence: 99%
“…However, mercury volatility and toxicity are significant obstacles for future usages. Other wetting techniques in electrolyte solutions are also reported for surface characterization using soft junctions . At nanoscale, platinum and tungsten hard metals have been widely used as conductive probes for electrical measurements and nanomanipulations. , Particularly, atomic force microscopy (AFM) using platinum electrodes has recently been employed as sliding metal–semiconductor contacts in the formation of triboelectric nanogenerators. , However, the use of hard metals has been reported to damage the surface of the semiconducting materials .…”
Section: Introductionmentioning
confidence: 99%