2015
DOI: 10.1016/j.jallcom.2015.05.151
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Combined XRD and XPS analysis of ex-situ and in-situ plasma hydrogenated magnetron sputtered Mg films

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Cited by 29 publications
(15 citation statements)
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“…(Figure C) The first peak at 1303.9 eV corresponds to Mg 1s in MgO. The second peak at 1302.7 eV is attributed to the contribution of Mg 1s in Mg(OH) 2 . The appearance of MgO and Mg(OH) 2 indicates that Mg alloy substrate reacts with the water in solution and generates oxide films during the preparation of PDA.…”
Section: Resultsmentioning
confidence: 98%
“…(Figure C) The first peak at 1303.9 eV corresponds to Mg 1s in MgO. The second peak at 1302.7 eV is attributed to the contribution of Mg 1s in Mg(OH) 2 . The appearance of MgO and Mg(OH) 2 indicates that Mg alloy substrate reacts with the water in solution and generates oxide films during the preparation of PDA.…”
Section: Resultsmentioning
confidence: 98%
“…In spite of all potential benefits of the plasma hydrogenation procedure, the latest work on the hydrogenation of the Mg thin films demonstrated its limitations. This work revealed that the Mg oxide and hydroxide layer are formed and effectively block the formation of the hydride, even if its formation might be starting not at the surface but at the film-substrate interface and/or bulk of the film [72].…”
Section: Synthesis Of Mgh 2 Using Hydrogen Plasmabased Hydrogenation mentioning
confidence: 91%
“…Thus, the result showed that the coatings contained Sb, and it was in the form of Sb 2 O 3 , while Sb 2 O 3 phase was not observed in the XRD patterns . According to the XPS peak, because the XPS binding energy of Mg2p and Si2p was 49.752 and 102.086eV, respectively, based on analyses, it could be assumed that Mg and Si were in the form of Mg 2+ and Si 4+ , respectively. Hence, the possible reactions are shown as follows:Mg-2eMg2+Mg2++O2-MgO…”
Section: Resultsmentioning
confidence: 98%