Combinatorial Generation and Analysis of Nanometer- and Micrometer-Scale Silicon Features via “Dip-Pen” Nanolithography and Wet Chemical Etching

Weinberger, Dana A.; Hong, Seunghun; Mirkin, Chad A.; Wessels, Bruce W.; Higgins, Thomas B.

doi:10.1002/1521-4095(200011)12:21<1600::aid-adma1600>3.0.co;2-6

Cited by 132 publications

(120 citation statements)

References 10 publications

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“…A number of qualitatively similar experiments have been recently reported [7,21] but analyzed using a different model [8], where the tip is treated as a source of constant flux (as opposed to concentration), and the concentration is zero outside an island. With these assumptions, the island radius should increase as t 1͞2 , which is inconsistent with our results [see the dashed line in Fig.…”

Section: Report Datementioning

confidence: 99%

Thiol Diffusion and the Role of Humidity in “Dip Pen Nanolithography”

2002

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The radii of octadecanethiol spots deposited by an atomic force microscope tip onto a gold surface were studied as a function of contact time and humidity. The deposition is well described by twodimensional diffusion from an annular source of constant concentration, with a surface diffusion coefficient of 8400 nm 2 s 21 , independent of humidity. Facile transfer is observed even after near continuous deposition for more than 24 h in a dry N 2 environment, indicating that a water meniscus is not required. DOI: 10.1103/PhysRevLett.88.156104 PACS numbers: 68.37.Ps, 68.43.Jk, 81.16.Nd, 81.16.Rf Since the first use of alkanethiols by Nuzzo and Allara [1] to form a self-assembled monolayer (SAM) on a gold surface, the number of applications for thiolated hydrocarbons has increased rapidly [2], ranging from resists for electronics to biosensor substrates. The major advantages offered by thiol SAMs include long-term stability, versatility in terminal functionality, and ease of use. Perhaps the most attractive feature is their utility for forming small, reproducible surface features outside of a clean room. For example, facile creation of micron-scale patterns has been demonstrated by "stamping" thiols onto a surface using a flexible polymer master, a technique known as microcontact printing (mCP) [3]. Even smaller, nanometer-scale features can be patterned from thiols using the recently developed "Dip Pen Nanolithography" (DPN) [4], where alkanethiols are "written" via transfer from an atomic force microscope (AFM) tip to a surface. The prospect of nanometer-scale control over physical dimensions combined with the flexible terminal group chemistry makes thiol patterning a critical component of many proposed nanotechnologies.Because alkanethiol patterning is emerging as a key technique for nanofabrication, it is crucial that the mechanisms of deposition -and thereby the ultimate technological potential-be understood. The most important process of the deposition may be diffusion, which controls both the extent and the quality of an alkanethiol SAM. As previously noted in a study of mCP [5], the spatial resolution of a pattern is fundamentally limited by diffusion of the thiol "ink." First, diffusion of the thiol beyond the initial contact area causes the pattern to be wider than the stamp (for mCP) or the AFM tip terminus (for DPN). Although there have been a few attempts to measure the diffusion rate of thiols on gold [5][6][7][8], these measurements have been mostly phenomenological and thus have not reported diffusion coefficients. A second, more subtle, effect of diffusion is its role in the phase transition that occurs during SAM deposition: At a critical surface concentration, the adsorbed thiols reorient from a prone to a standing orientation. This change in orientation affects physical properties of the SAM, such as friction, as well as important chemical properties, such as its ability to mask the substrate from an etchant [9].Another important issue in determining the overall potential of DPN is the role of ...

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Section: Report Datementioning

confidence: 99%

Thiol Diffusion and the Role of Humidity in “Dip Pen Nanolithography”

2002

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“…SPM lithography can be used to fabricate nanoscale structures by various methods such as electrochemical oxidation [9][10][11], material transfer [12][13][14], mechanical removal [15][16][17][18][19] and thermal reaction [21,22]. This technique is effective for fabricating nanometer-scale structures.…”

Section: Spm-based Lithographymentioning

confidence: 99%

Three-Dimensional Lithography Using Combination of Nanoscale Processing and Wet Chemical Etching

Kawasegi¹,

Morita²

2013

Updates in Advanced Lithography

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“…Surface binding in the these demonstrations ranges from strong covalent bonds, as in the thiol-gold [I] and silane-oxide [9] systems, to weaker electrostatic, van der Waals, hydrophobic, and hydrogen bonds [ 10]. In some cases, the covalent chemistries have been shown strong enough to act as masks in various substrate etching applications [11,14].…”

Section: Introductionmentioning

confidence: 99%

Development of Parallel Dip Pen Nanolithography Probe Arrays for High Throughput Nanolithography

et al. 2002

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Dip Pen Nanolithography (DPN) is a lithographic technique that allows direct deposition of chemicals, metals, biological macromolecules, and other molecular "inks" with nanometer dimensions and precision. This paper addresses recent developments in the design and demonstration of high-density multiprobe DPN arrays. High-density arrays increase the process throughput over individual atomic force microscope (AFM) probes and are easier to use than arrays of undiced commercial probes. We have demonstrated passive arrays made of silicon (8 probes, 310 pim tip-to-tip spacing) and silicon nitride (32 probes, 100 pin tip-to-tip spacing). We have also demonstrated silicon nitride "active" arrays (10 probes, 100 pim tip-to-tip spacing) that have embedded thermal actuators for individual probe control. An optimization model for these devices, based on a generalized multilayer thermal actuator, is also described.

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Combinatorial Generation and Analysis of Nanometer- and Micrometer-Scale Silicon Features via “Dip-Pen” Nanolithography and Wet Chemical Etching

Cited by 132 publications

References 10 publications

Thiol Diffusion and the Role of Humidity in “Dip Pen Nanolithography”

Thiol Diffusion and the Role of Humidity in “Dip Pen Nanolithography”

Three-Dimensional Lithography Using Combination of Nanoscale Processing and Wet Chemical Etching

Development of Parallel Dip Pen Nanolithography Probe Arrays for High Throughput Nanolithography

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