2011
DOI: 10.1016/j.carbon.2010.09.001
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Combinatorial catalyst approach for high-density growth of horizontally aligned single-walled carbon nanotubes on sapphire

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Cited by 21 publications
(22 citation statements)
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“…[ 33,34 ] As schematically shown in Supporting Information (Figure S6), the combinatorial mask produces an inhomogeneous Ni coverage: density gradually decreases with the distance from the slit. [ 34 ] The optimum etching density for the synthesis of GNRs shown in Figure 2 corresponds to that of Figure 3 b, while densities of Ni that are too high or too low lead to etching that is unsuitable for GNR production. At areas of low Ni density, the etching lines are not enough to produce GNRs (Figure 3 a), while at high-density areas, misalignment of the etching lines occurs (Figure 3 c).…”
Section: Communicationmentioning
confidence: 98%
See 1 more Smart Citation
“…[ 33,34 ] As schematically shown in Supporting Information (Figure S6), the combinatorial mask produces an inhomogeneous Ni coverage: density gradually decreases with the distance from the slit. [ 34 ] The optimum etching density for the synthesis of GNRs shown in Figure 2 corresponds to that of Figure 3 b, while densities of Ni that are too high or too low lead to etching that is unsuitable for GNR production. At areas of low Ni density, the etching lines are not enough to produce GNRs (Figure 3 a), while at high-density areas, misalignment of the etching lines occurs (Figure 3 c).…”
Section: Communicationmentioning
confidence: 98%
“…During sputtering, a sample was covered by a combinatorial mask with a slit on it, allowing Ni deposition with varying densities. [ 33,34 ] The etching was conducted in a quartz tube using a mixed gas of Ar/H 2 (ratio 85/15), in a two-step process: the fi rst step involves annealing at 400 °C for 1 hour to remove impurities; the second step is the etching itself, which is carried out at 1100 °C for 30 minutes, followed by a slow cool down to room temperature.…”
Section: Supporting Informationmentioning
confidence: 99%
“…They have also studied catalytic activities of single and binary metal catalysts for SWNT arrays growth on sapphire. And different density SWNT arrays could be achieved with varied CH 4 concentrations . In principle, SWNT arrays with even higher density may be obtained by combining the advantages of the above methods.…”
Section: Density Controlmentioning
confidence: 99%
“…In the CVD process, the catalyst is a key factor for growing SWNTs on substrates [12][13][14] . How to maintain the activity of catalysts 15,16 , give catalyst nanoparticles more opportunities to nucleate SWNTs 9,17 and provide new catalysts during SWNT growth 8 are key issues for obtaining SWNT arrays with ultra-high density on substrates. In this study, ultra-high density of SWNT arrays were realized through use of Trojan catalysts.…”
mentioning
confidence: 99%