2013
DOI: 10.1038/nature11999
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Colossal injection of catalyst atoms into silicon nanowires

Abstract: The incorporation of impurities during the growth of nanowires from the vapour phase alters their basic properties substantially, and this process is critical in an extended range of emerging nanometre-scale technologies. In particular, achieving precise control of the behaviour of group III and group V dopants has been a crucial step in the development of silicon (Si) nanowire-based devices. Recently it has been demonstrated that the use of aluminium (Al) as a growth catalyst, instead of the usual gold, also … Show more

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Cited by 139 publications
(168 citation statements)
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“…For most NWs, EDS cannot detect any obvious Au signal, but for some NWs, a much smaller Au particle is found to reside on the middle region of them. This suggests that the Au catalyst particle may diffuse away from the NW top and mainly diffuse into the bulk NW during our GaSb growth; similar results have also been reported in silicon NWs by previous literatures [33][34][35]. The diffusion behavior of Au atoms has exerted an important influence on the GaSb growth mode.…”
Section: Resultssupporting
confidence: 75%
“…For most NWs, EDS cannot detect any obvious Au signal, but for some NWs, a much smaller Au particle is found to reside on the middle region of them. This suggests that the Au catalyst particle may diffuse away from the NW top and mainly diffuse into the bulk NW during our GaSb growth; similar results have also been reported in silicon NWs by previous literatures [33][34][35]. The diffusion behavior of Au atoms has exerted an important influence on the GaSb growth mode.…”
Section: Resultssupporting
confidence: 75%
“…30,31 The rapid formation of steps and also the high step velocity enhances the impurity, or the solute trapping, and its incorporation into the matrix. 32,33 Rapid formation of Ge nanowires with oligosilylgermane precursors provides a high step velocity during the synthesis of the nanowires which enhances the probability of In adatoms being trapped at the catalyst-nanowire interface with the fast deposition of successive layers during nanowire growth. The fact that nanowires with faster growth kinetics, synthesized with precursor 1 over 5 min reaction time, exhibited higher In incorporation (1.8 at%) compared to nanowires with slower growth rates synthesized with precursor 2 over a 10 min reaction time (0.9 at%), is evidence that kinetic-dependent solute trapping of In incorporation in the Ge nanowire lattice is happening.…”
Section: High Level Of In Incorporation In Ge Nanowiresmentioning
confidence: 99%
“…[4][5][6][7][8][9][10] Quantum dots can be inserted in semiconductor nanowires either deterministically, with specific shape and composition, [11][12][13][14] or as self-assembled structures. [15][16][17][18] Nanowires, furthermore, represent a model system for atom probe analysis, [19][20][21][22][23][24] as they closely approximate the shape of a field-emission tip. Nevertheless, and despite the interest of nanowire-based QDs for quantum information [25][26][27][28][29] and for their integration in nanoscale optoelectronic devices, [30][31][32][33] no studies of nanowire QDs by APT have been reported yet.…”
mentioning
confidence: 99%