2013
DOI: 10.1111/jace.12187
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Color‐Tunable Up‐Conversion Emission and Infrared Photoluminescence and Dielectric Relaxation of Er3+/Yb3+ Co‐Doped Bi2Ti2O7 Pyrochlore Thin Films

Abstract: The color‐tunable up‐conversion (UC) emission and infrared photoluminescence and dielectric relaxation of Er3+/Yb3+ co‐doped Bi2Ti2O7 pyrochlore thin films prepared by a chemical solution deposition method have been investigated. The pyrochlore phase structure of Bi2Ti2O7 can be stabilized by Er3+/Yb3+ co‐doping. Intense color‐tunable UC emission and infrared photoluminescence can be detected on the thin films excited by a 980 nm diode laser. Two UC emission bands centered at 548 and 660 nm in the spectra can … Show more

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Cited by 26 publications
(17 citation statements)
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“…With relatively high permittivity, low dielectric loss, and low sintering temperature, Bi 2 Ti 2 O 7 is a promising candidate material for the integrated capacitor applications [3,4]. Pyrochlore structure bismuth titanate thin film has also been used as a buffer layer to improve the electrical properties of In addition, recent studies suggested that Bi 2 Ti 2 O 7 is a potential host material for rare earth photoluminescence [8,9], because of its wide band gap, high refractive index, and low phonon energy [10]. Furthermore, doping with rare earth ions such as La 3þ has been proved to be an effective method to improve the electrical properties of Bi 2 Ti 2 O 7 [11].…”
Section: Introductionmentioning
confidence: 99%
“…With relatively high permittivity, low dielectric loss, and low sintering temperature, Bi 2 Ti 2 O 7 is a promising candidate material for the integrated capacitor applications [3,4]. Pyrochlore structure bismuth titanate thin film has also been used as a buffer layer to improve the electrical properties of In addition, recent studies suggested that Bi 2 Ti 2 O 7 is a potential host material for rare earth photoluminescence [8,9], because of its wide band gap, high refractive index, and low phonon energy [10]. Furthermore, doping with rare earth ions such as La 3þ has been proved to be an effective method to improve the electrical properties of Bi 2 Ti 2 O 7 [11].…”
Section: Introductionmentioning
confidence: 99%
“…Then a non‐radiative decay takes place in the Er 3+ ion through the populated state to the 2 H 11/2 , 4 S 3/2 levels, and then the green 2 H 11/2 → 4 I 15/2 and 4 S 3/2 → 4 I 15/2 emissions occur. Alternatively, the ion can further relax and populate the 4 F 9/2 level, which can lead to the red 4 F 9/2 → 4 I 15/2 emission . The whole process of Sr 2 CeO 4 :Yb 3+ /Er 3+ can be expressed as following formulas: (1) 2 F 7/2 (Yb 3+ ) + 980 nm photon → 2 F 5/2 (Yb 3+ ); (2) 2 F 5/2 (Yb 3+ ) + 4 I 15/2 (Er 3+ ) → 2 F 7/2 (Yb 3+ ) + 4 I 11/2 (Er 3+ ) (ET1); (3) 4 I 11/2 (Er 3+ ) → 4 I 13/2 (Er 3+ ); (4) 2 F 5/2 (Yb 3+ ) + 4 I 13/2 (Er 3+ ) → 2 F 7/2 (Yb 3+ ) + 4 F 7/2 (Er 3+ ) + 4 F 9/2 (Er 3+ ) (ET2); (5) 4 F 7/2 (Er 3+ ) → 2 H 11/2 (Er 3+ ) + 4 S 3/2 (Er 3+ ) + 4 F 9/2 (Er 3+ ), 4 F 9/2 (Er 3+ ) → 4 I 15/2 (Er 3+ , red); and (6) 2 H 11/2 (Er 3+ ) + 4 S 3/2 (Er 3+ ) → 4 I 15/2 (Er 3+ , green).…”
Section: Resultsmentioning
confidence: 99%
“…It is well known that UC efficiency is mainly dependent on the host material and doping ion, especially the former, a change of the host can enhance or decrease significantly the UC luminescent properties for it can strongly influence the transitions of the lanthanides, therefore ongoing research is mainly concerned with the quest for host materials with increased conversion efficiencies. The UC luminescence of rare earth ions has been investigated in various matrices, such as Gd 2 O 3 , In 2 O 3 , Bi 2 Ti 2 O 7 , NaGdF 4 , and NaYF 4 , etc. Among which NaYF 4 :Er 3+ ,Yb 3+ has been proved to give the strongest UC emissions.…”
Section: Introductionmentioning
confidence: 99%
“…In spite of this unique characteristic, the Er 3 þ UC emission studies on films have been focused mainly to the preparation of Er 3 þ and Yb 3 þ co-doped films of materials such as Bi 2 Ti 2 O 7 , Y 2 Ti 2 O 7 , ZnO, Y 3 Al 5 O 12 , among others. These films are deposited by methods such as chemical solution deposition, sol gel, radio-frequency magnetron sputtering, dip coating among others [11][12][13][14].…”
Section: Introductionmentioning
confidence: 99%