2009
DOI: 10.1149/1.3089364
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Colloidal Nanoparticle-Layer Formation Through Dip-Coating: Effect of Solvents and Substrate Withdrawing Speed

Abstract: The effect of solvents of colloidal solution and substrate withdrawing speed during dip-coating on the nanoparticle-layer formation of sterically stabilized iron oxide ͑␥-Fe 2 O 3 ͒ nanoparticles on Si substrates is investigated. From the solutions with 10 13 -10 14 mL −1 particle concentrations dispersed in hexane, octane, decane, and tetradecane, the multilayer is formed from hexane while the uniform monolayer is formed from octane, decane, and tetradecane. Because the particle layer is formed by direct adso… Show more

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Cited by 28 publications
(15 citation statements)
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References 41 publications
(69 reference statements)
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“…[58][59][60][61][62][63] One example of colloidal lithography can be explained as following: Monodispersed SiO 2 particles, with diameters from 50 to 800 nm, are synthesized by a modified St€ ober process 64 and then modified with aminopropyl diethoxymethylsilane (APDEMS) in order to terminate their surface with positively charged amine groups, which prevents aggregation of the particles. [58][59][60][61][62][63] One example of colloidal lithography can be explained as following: Monodispersed SiO 2 particles, with diameters from 50 to 800 nm, are synthesized by a modified St€ ober process 64 and then modified with aminopropyl diethoxymethylsilane (APDEMS) in order to terminate their surface with positively charged amine groups, which prevents aggregation of the particles.…”
Section: Fabrication: Nanostructurementioning
confidence: 99%
“…[58][59][60][61][62][63] One example of colloidal lithography can be explained as following: Monodispersed SiO 2 particles, with diameters from 50 to 800 nm, are synthesized by a modified St€ ober process 64 and then modified with aminopropyl diethoxymethylsilane (APDEMS) in order to terminate their surface with positively charged amine groups, which prevents aggregation of the particles. [58][59][60][61][62][63] One example of colloidal lithography can be explained as following: Monodispersed SiO 2 particles, with diameters from 50 to 800 nm, are synthesized by a modified St€ ober process 64 and then modified with aminopropyl diethoxymethylsilane (APDEMS) in order to terminate their surface with positively charged amine groups, which prevents aggregation of the particles.…”
Section: Fabrication: Nanostructurementioning
confidence: 99%
“…This resulted in the formation of films of RE-nanoparticles sparsely deposited on the hydrophilic regions. Advective flow of the dispersion to the meniscus caused by the evaporation of dispersion medium from the meniscus works as the driving force for the formation of nanoparticle films on the substrates according to the literature [32][33][34]. This suggests that the formation of sparse films in this study is due to the effect of the sedimentation of REnanoparticles.…”
Section: Resultsmentioning
confidence: 60%
“…The thickness of the deposited film can be controlled by selecting a proper solution concentration and a suitable spin-rate. In the layer-by-layer dip-coating method, a thin film, typically consisting of one or two ordered layers of nanocrystals, is obtained by the condensation of nanoparticles at the meniscus due to the lateral capillary force [6]. A thicker film can be deposited by using multiple dip-coating steps.…”
Section: Fabricationmentioning
confidence: 99%