Collision processes between sputtered particles on high speed rotating substrate and atomic mass dependence of sticking coefficient

Obara, Kozo; Fu, Zixun; Arima, Masahiro; Yamada, Takeshi; Fujikawa, Takashi; Imamura, N; Terada, Norio

doi:10.1016/s0022-0248(01)02306-5

Cited by 8 publications

(7 citation statements)

References 7 publications

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“…10,11 The prevailing effects of shadowing and re-emission rely on their "nonlocal" character: The growth of a given surface point depends on the heights of near and far-away surface locations due to shadowing and existence of re-emitted particles that can travel over long distances. Figure 4 summarizes some of the experimentally measured sticking coefficient values reported in the literature during evaporation, 33 sputtering, [34][35][36][37][38][39][40][41] and CVD [42][43][44][45][46][47][48] growth of various thin-film materials. Names of incident atoms/molecules on the growing film are also labeled.…”

Section: Shadowing and Re-emission Effectsmentioning

confidence: 99%

Thin-film growth dynamics with shadowing and re-emission effects

Karabacak

2011

J. Nanophoton

101

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Growth dynamics of thin-films involves both shadowing and re-emission effects. Shadowing can originate from obliquely incident atoms being preferentially deposited on hills of the surface, which leads to a long range geometrical effect, as well as from an atomic shadowing process that can occur even during normal angle deposition. Re-emission effect is a result of nonsticking atoms, which can bounce off from hills and deposit on valleys of the surface. In the case of an energetic incident flux, re-emission can also originate from a resputtering process that includes a surface atom being knocked off by an incident ion/atom followed by redeposition to another surface point. Due to their long-range nonlocal nature, both the shadowing effect (which tries to roughen the surface) and re-emission effect (which has a smoothening effect) have been shown to be more dominant over local effects such as surface diffusion, and have been proven to be critical processes in accurately determining the dynamic evolution of surface roughness. Recent Monte Carlo simulation methods that involve shadowing, re-emission, surface diffusion, and noise effects successfully predicted many experimentally relevant surface roughness evolution results reported in the literature. For example, root-mean-square surface roughness (ω) of Monte Carlo simulated thin-films have evolved with time t according to a power law behavior ω ∼ t β , with β values ranging from about 0 to 1 for a growth with strong re-emission effects (i.e., low sticking coefficients) and a growth with dominant shadowing effects (i.e., with high sticking coefficients), respectively. Potential future thin-film growth modeling studies are also discussed. These include advanced simulation approaches that can incorporate atomistic details of physical and chemical processes and a recently developed network growth model that can potentially capture some universal aspects of thin-film growth dynamics independent of the details of growth process. C 2011 Society of Photo-Optical Instrumentation Engineers (SPIE).

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Section: Shadowing and Re-emission Effectsmentioning

confidence: 99%

Thin-film growth dynamics with shadowing and re-emission effects

Karabacak

2011

J. Nanophoton

101

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“…15,17,22,23 FIG. 3: (Color online) Some of the experimentally measured sticking coefficient values reported in the literature during evaporation, 24 sputtering, 25,26,27,28,29,30,31,32 and CVD 3,33,34,36,37,38,39 growth are shown. Names of incident atoms/molecules on the growing film are also labeled.…”

Section: Introductionmentioning

confidence: 99%

Network behavior in thin film growth dynamics

2009

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We present a new network modeling approach for various thin film growth techniques that incorporates re-emitted particles due to the non-unity sticking coefficients. We model re-emission of a particle from one surface site to another one as a network link, and generate a network model corresponding to the thin film growth. Monte Carlo simulations are used to grow films and dynamically track the trajectories of re-emitted particles. We performed simulations for normal incidence, oblique angle, and chemical vapor deposition (CVD) techniques. Each deposition method leads to a different dynamic evolution of surface morphology due to different sticking coefficients involved and different strength of shadowing effect originating from the obliquely incident particles. Traditional dynamic scaling analysis on surface morphology cannot point to any universal behavior. On the other hand, our detailed network analysis reveals that there exist universal behaviors in degree distributions, weighted average degree versus degree, and distance distributions independent of the sticking coefficient used and sometimes even independent of the growth technique. We also observe that network traffic during high sticking coefficient CVD and oblique angle deposition occurs mainly among edges of the columnar structures formed, while it is more uniform and short-range among hills and valleys of small sticking coefficient CVD and normal angle depositions that produce smoother surfaces.

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“…The prevailing effects of shadowing and re-emission rely on their 'non-local' character: The growth of a given surface point depends on the heights of near and far-away surface locations due to shadowing and the existence of re-emitted particles that can travel over long distances. Figure 16.3 summarizes some of the experimentally measured sticking coefficient values reported in the literature during evaporation [23], sputtering [24][25][26][27][28][29][30][31], and CVD [32][33][34][35][36][37][38] growth of various thin film materials. Names of incident atoms/molecules on the growing film are also labeled.…”

Section: W O O D H E a D P U B L I S H I N G L I M I T E Dmentioning

confidence: 99%