Controlled functionalisation of nano-and low-dimensional materials will open possibilities for fabrication of innovative devices, e.g., long aspired single photon sources and devices for quantum metrology based on these materials. Achievement of these is very likely, if nanoscale localised electronic doping compatible with large-scale integrated semiconductor technologies can be achieved. Targeted doping, of nano-tubes and 2-D materials, e.g., graphene and monolayer BN as well as transition metal dichalcogenides (TMDs), has been attempted here via ultra-low energy ion implantation in order to tailor bandstructure and thus opto-electronic properties [1, 2, 3, 4]. TMDs are particularly promising for quantum device purposes, as they possess many unique properties, such as large direct bandgaps, optically addressable spin and valley pseudospin degrees of freedom and large magnetic moments.