Collection and Sputtering Experiments with Noble Gas Ions

Almén, O.; Bruce, G.

doi:10.1007/978-3-7091-5087-0_22

Cited by 6 publications

(6 citation statements)

References 2 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The universal curve is in good agreement with the experiments by Wehner (19551, Weijsenheld (1966), Almen et al (1961), Keywell (19551, Dupp and Schermann (1966), and Kanaya et al (1973, 19861, as shown in Figure 2. Figure 3 shows the serious parameters concerning the sputtering phenomena; Et, a, and A as a function of Z.…”

Section: Asupporting

confidence: 90%

Application of ion beam sputtering for high‐resolution electron microscopy

Kanaya

Baba

Muranaka

et al. 1986

J. Elec. Microsc. Tech.

View full text Add to dashboard Cite

Ion beam sputtering for high-resolution electron microscopy has basically provided miscellaneous operational features such as atomic shadowing, uncoated observation, and etching of biological specimens coupled with tungsten sputter coating and thinning of solid materials.Based on the power-potential law of Lindhard for ionic impact phenomena on metal surfaces, the universal yield-energy relationship has been derived. Thereby the sputtering deposition rate with reference to the sputtering removal rate was obtained as a function of sputtering yield, and the most important angular distribution of sputtering yield could be measured by using the hemicylindrical specimen stage.Evidence is presented to show that ion beam sputtering has become one of the most powerful tools for high-resolution electron microscopy.

show abstract

Section: Asupporting

confidence: 90%

Application of ion beam sputtering for high‐resolution electron microscopy

Kanaya

Baba

Muranaka

et al. 1986

J. Elec. Microsc. Tech.

View full text Add to dashboard Cite

show abstract

“…Molecular beam epitaxy (MBE) is a renowned, notably precise but rather costly deposition technique [43,44]. Moreover, sputtering [45], where particles are ejected from a solid target material as it is bombarded by energetic particles, is widely used in the industry for the deposition of metals [46]. Finally, the pulsed layer deposition (PLD) has been given account for being able to construct thin metal films [47].…”

Section: Designing and Fabrication Processesmentioning

confidence: 99%

Wide-angle absorption of visible light from simple bilayers

et al. 2017

View full text Add to dashboard Cite

Color-selective absorption of light is a very significant operation used in numerous applications, from photonic sensing and switching to optical signal modulation and energy harnessing. We demonstrate angle-insensitive and polarization-independent absorption by thin bilayers comprising ordinary bulk media: dielectrics, semiconductors, and metals. Several highly efficient designs for each color of the visible spectrum are reported, and their internal fields' distributions reveal the resonance mechanism of absorption. The proposed bilayer components are realizable, since various physical or chemical deposition methods can be used for their effective fabrication. The absorption process is found to exhibit endurance with respect to the longitudinal dimension of the planar structure, which means that the same designs could be successfully utilized in non-planar configurations composed of arbitrary shapes.

show abstract

“…In the early days of sputtering theory, it was proposed that the sputtering yield exhibits an angular dependence proportional to ( ) (Almen & Bruce, 1961;Molchanov & Tel'kovsky, 1961). More recent work (Jurac et al, 1998) has suggested that for fast moving projectiles, the angular dependence is not proportional to but is proportional to ( …”

Section: Sputteringmentioning

confidence: 99%