Collapse of hard-axis behavior in uniaxial Co films

Idigoras, O.; Suszka, A. K.; Vavassori, P.; Landeros, P.; Porro, José María; Berger, Andreas

doi:10.1103/physrevb.84.132403

Cited by 41 publications

(26 citation statements)

References 29 publications

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“…Interestingly, our results show that due to the large size of the antidots, the qualitative coercivity behavior is very similar for all the antidot samples [17,32]. The peak in the coercivity plot along the hard axis is due to grain orientation disorder [33] which arises due to the non-epitaxial behavior of the film. It is also seen that the coercivity value is highest for sample 4 and lowest for sample 3.…”

Section: Methodsmentioning

confidence: 58%

Size and shape dependence study of magnetization reversal in magnetic antidot lattice arrays

Mallick

Bedanta

2015

Journal of Magnetism and Magnetic Materials

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Section: Methodsmentioning

confidence: 58%

Size and shape dependence study of magnetization reversal in magnetic antidot lattice arrays

Mallick

Bedanta

2015

Journal of Magnetism and Magnetic Materials

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“…Thus, we have studied here the origin of the HA anomalous magnetization reversal in detail. We have reported on the existence of the HA anomaly previously, 75 classified its occurrence in correlation with the crystallographic order in our samples, as well as given a qualitative argument for it by means of a simple model. In this work, we present our full analysis of this phenomenon and make quantitative comparisons with model calculations.…”

Section: Anomalous Magnetization Reversal Near the Hamentioning

confidence: 96%

Magnetization reversal of in-plane uniaxial Co films and its dependence on epitaxial alignment

Idigoras

Suszka

Vavassori

et al. 2014

Journal of Applied Physics

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This work studies the influence of crystallographic alignment onto magnetization reversal in partially epitaxial Co films. A reproducible growth sequence was devised that allows for the continuous tuning of grain orientation disorder in Co films with uniaxial in-plane anisotropy by the controlled partial suppression of epitaxy. While all stable or meta-stable magnetization states occurring during a magnetic field cycle exhibit a uniform magnetization for fully epitaxial samples, non-uniform states appear for samples with sufficiently high grain orientation disorder. Simultaneously with the occurrence of stable domain states during the magnetization reversal, we observe a qualitative change of the applied field angle dependence of the coercive field. Upon increasing the grain orientation disorder, we observe a disappearance of transient domain wall propagation as the dominating reversal process, which is characterized by an increase of the coercive field for applied field angles away from the easy axis for well-ordered epitaxial samples. Upon reaching a certain disorder threshold level, we also find an anomalous magnetization reversal, which is characterized by a non-monotonic behavior of the remanent magnetization and coercive field as a function of the applied field angle in the vicinity of the nominal hard axis. This anomaly is a collective reversal mode that is caused by disorder-induced frustration and it can be qualitatively and even quantitatively explained by means of a two Stoner-Wohlfarth particle model. Its predictions are furthermore corroborated by Kerr microscopy and by Brillouin light scattering measurements.

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“…15,22 It may be noted that the remanence does not become zero even along the hard axis, suggesting that there is some distribution in the direction of hard axis. 23,24 However, the azimuthal angle dependence of remanence could be very well fitted with Stoner-Wohlfarth model (results not shown) giving the value of the orientation ratio as 1.5. 24 The saturation magnetization was calculated by taking the known value of the magnetic moment of the Co as 1.72µ B per atom.…”

mentioning

confidence: 97%

Evolution of magnetic anisotropy in cobalt film on nanopatterned silicon substrate studied in situ using MOKE

Bukharia

Karmakar

Kumar

et al. 2020

Journal of Magnetism and Magnetic Materials

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Evolution of magnetization behaviour of cobalt film on nano patterned silicon substrate, with film thickness, has been studied. In situ magneto-optical Kerr effect measurements during film deposition allowed us to study genuine thickness dependence of magnetization behaviour, all other parameters like surface topology, deposition conditions remaining invariant. The film exhibits uniaxial magnetic anisotropy, with its magnitude decreasing with increasing film thickness. Analysis shows that anisotropy has contributions from both, i) exchange energy which is volume dependent and, ii) stray dipolar fields at the surface/interface. This suggests that local magnetization follows only partially the topology of the rippled surface. As expected from energy considerations, for small film thickness, the local magnetization closely follows the surface contour of the ripples making the volume term as the dominant contribution. With increasing film thickness, the local magnetization gradually deviates from the local slope and approaches towards a uniform magnetization along the macroscopic film plane making the surface term as the dominant contribution. Significant deviation from the anisotropy energy expected on the basis of theoretical considerations can be attributed to several factors like, deviation of surface topology from an ideal sinusoidal wave, breaks of continuity along the ripple direction, defects like pattern dislocations, and possible decrease in surface modulation depth with increasing film thickness.

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Collapse of hard-axis behavior in uniaxial Co films

Cited by 41 publications

References 29 publications

Size and shape dependence study of magnetization reversal in magnetic antidot lattice arrays

Size and shape dependence study of magnetization reversal in magnetic antidot lattice arrays

Magnetization reversal of in-plane uniaxial Co films and its dependence on epitaxial alignment

Evolution of magnetic anisotropy in cobalt film on nanopatterned silicon substrate studied in situ using MOKE

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