2019
DOI: 10.1021/acsami.9b15034
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Coherent Epitaxial Semiconductor–Ferromagnetic Insulator InAs/EuS Interfaces: Band Alignment and Magnetic Structure

Abstract: Hybrid semiconductor -ferromagnetic insulator heterostructures are interesting due to their tunable electronic transport, self-sustained stray field and local proximitized magnetic exchange. In this work, we present lattice matched hybrid epitaxy of semiconductor -ferromagnetic insulator InAs/EuS heterostructures and analyze the atomic-scale structure as well as their electronic and magnetic characteristics. The Fermi level at the InAs/EuS interface is found to be close to the InAs conduction band and in the b… Show more

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Cited by 38 publications
(51 citation statements)
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“…[ 52 ] The effective Hubbard parameter U*=UJ=5 eV was chosen to ensure the binding energy of Eu 4f states to be in agreement with available photoemission experiments. [ 53,54 ] To verify the value of U*, we calculated various magnetic properties of EuS bulk. The obtained magnetic moment μEutheory=6.93 normalμnormalB and the Curie temperature TnormalCtheory=15.3 K are in good agreement with experimental results, μEuexp7normalμnormalB and TnormalCexp=16.3 K, respectively.…”
Section: Ab Initio Calculationsmentioning
confidence: 99%
“…[ 52 ] The effective Hubbard parameter U*=UJ=5 eV was chosen to ensure the binding energy of Eu 4f states to be in agreement with available photoemission experiments. [ 53,54 ] To verify the value of U*, we calculated various magnetic properties of EuS bulk. The obtained magnetic moment μEutheory=6.93 normalμnormalB and the Curie temperature TnormalCtheory=15.3 K are in good agreement with experimental results, μEuexp7normalμnormalB and TnormalCexp=16.3 K, respectively.…”
Section: Ab Initio Calculationsmentioning
confidence: 99%
“…In Ref. [21] a defect-free heterostructure between an InAs semiconductor wire and EuS has been prepared and studied. Negligible direct magnetization of InAs was reported.…”
Section: Introductionmentioning
confidence: 99%
“…Partly-overlapping, two-faceted EuS (as grown thickness 8 nm) and Al (as grown thickness 6 nm) shells were grown in situ using electron beam evaporation, as shown in the maintext Fig. 1(a) [28,39]. Devices were fabricated on a Si substrate with 200 nm SiOx capping.…”
Section: Supplementary Materials Sample Preparationmentioning
confidence: 99%