The temperature and density dependence of the phase coherence time τϕ in high-mobility silicon inversion layers was determined from the magnetoresistivity due to weak localization. The upper temperature limit for single-electron quantum interference effects was delineated by comparing τϕ with the momentum relaxation time τ . A comparison between the density dependence of the borders for quantum interference effects and the strong resistivity drop reveals that theses effects are not related to each other. As the strong resistivity drop occurs in the Drude regime, the apparent metallic behavior can not be caused by quantum coherent effects.The apparent "metallic" state in two dimensions (2D)[1] has attracted much attention as it seems to contradict the one parameter scaling theory of Abrahams et al. [2]. Following the confirmation of the "metallic" behavior in several material systems, the question was raised whether the "metallic" state constitutes a new quantum mechanical ground state, or if the resistivity drop towards lower temperature is based on semiclassical (i.e., noncoherent) effects (see [3] and references therein).We answer this question for Si-metal oxide semiconductor (MOS) structures, by excluding quantum interference (QI) effects as the origin of the "metallic" state. This is achieved by determining the phase coherence time τ ϕ from the weak localization (WL) behavior and comparing it with the momentum relaxation time τ at different temperatures T and densities n. For τ ϕ > τ (low-T regime), single-electron quantum interference effects occur, whereas for τ ϕ < τ (high-T ) they do not, as the coherence time is too short to allow electrons a coherent return to their origin. By comparing the phase coherent regime with the "metallic" regime, we find that they are not correlated with each other and that "metallic" behavior exists even without phase coherence. In addition, we dertermine the temperature where k B T =h/τ , which marks the threshold for coherent electron-electron (e − e) interaction effects. Again, no correlation with the "metallic" regime is found.The T dependence of the phase coherence was already investigated in the early 80's in Si-MOS structures (see [4,5]). But due to the lack of the "metallic" state in these low-mobility samples, no appropriate conclusion could be drawn. In recent studies on high-mobility samples with "metallic" behavior, it was shown that the WL has only small effects on ρ for GaAs/AlGaAs [6] and Si/SiGe [7]. Also for Si-MOS structures in the low ρ (high n) regime, the WL contribution is small and it was shown that spinorbit coupling is not visible for τ ϕ up to 100 ps [8]. But so far, the borders for phase coherence were not determined systematically on a sample with strong "metallic" behavior in order to decide among the possible underlying mechanisms.Our investigations were performed on two highmobility Si-MOS samples Si-15 and Si-43 with peak mobilities of µ = 31 000 and 20 000 cm 2 /Vs, respectively. Resistivity and Hall measurements were performed with a four t...