Cobalt−Palladium and Cobalt−Platinum Bilayer Films Formed by Chemical Vapor Deposition

Abstract

The complexes [Co 3 (CO) 9 CCl], [Co 3 (CO) 9 CH], [Co 2 (CO) 6 (HCtCPh)] and [Co 2 (CO) 6 (HCtC t -Bu)] are shown to be excellent precursors for CVD of pure cobalt films, when using hydrogen as carrier gas. These compounds all possess good air and moisture stability, have high volatility, and are easy to prepare, store, and handle. Using these precursors and the known palladium and platinum precursors [Pd(hfac) 2 ] and [PtMe 2 (COD)], it has been shown that bilayer films glass/Co/Pd, glass/Pd/Co, glass/Co/Pt, and glass/Pt/Co can be grown easily. There is a sharp boundary and good adhesion between the two metal layers, suggesting that this method may be suitable for the formation of bilayer films for magnetooptical applications.

Pt, PtNi and PtCoNi film electrocatalysts prepared by chemical vapor deposition for the oxygen reduction reaction in 0.5M KOH

“…Electrocatalyst Films thickness was estimated by cross-sectional SEM (micrographs not shown) and was about 180-250 nm, in accordance with other films reported elsewhere [24,25]. Fig.…”

“…The films oxygen content (as confirmed later by EDAX) is due to the fact that film top surface is oxidized by air. Oxygen content can vary through film thickness [24,25]. Fig.…”

Characterization of pure ZnO thin films prepared by a direct photochemical method

“…As expected, only Zn, O and C contributions are observed in the spectrum. Although it has been argued that the presence of phenyl rings in the precursors often introduces carbon impurities in MOCVD of other metals [28], the carbon detected on the surface of the as-deposited film is probably the result of contamination rather than an inefficient photolysis. After 60 s Ar + sputtering no carbon was detected on the film surface.…”

Zr(IV) and Hf(IV) β-diketonate complexes as precursors for the photochemical deposition of ZrO2 and HfO2 thin films

“…The high carbon content detected on the surface of the as-deposited films is probably the result of contamination rather than an inefficient photolysis. It has been argued that presence of phenyl rings in the precursors often introduces carbon impurities in MOCVD of other metals [30]. Other authors have found that the metal b-diketonates such as [Hf(aca) 4 ] require high substrate temperatures and can lead to carbon incorporation in MOCVD [31].…”