Handbook of Neuroengineering 2023
DOI: 10.1007/978-981-16-5540-1_7
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Coatings for Microneural Implants: Electrical Considerations

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“…Overall, the sputtering method can perform wafer‐level online modification on high‐density neural recording sites with high efficiency, but the impedance performance of the modified recording sites varies depending on the sputtering parameters and the positions on the wafer [72] . Therefore, there is ample room for optimization in achieving the high consistency of impedance performance of high‐density microelectrodes to improve the yield rate of a neural electrode array.…”
Section: High‐density Neural Recording Electrodesmentioning
confidence: 99%
“…Overall, the sputtering method can perform wafer‐level online modification on high‐density neural recording sites with high efficiency, but the impedance performance of the modified recording sites varies depending on the sputtering parameters and the positions on the wafer [72] . Therefore, there is ample room for optimization in achieving the high consistency of impedance performance of high‐density microelectrodes to improve the yield rate of a neural electrode array.…”
Section: High‐density Neural Recording Electrodesmentioning
confidence: 99%