“…For HCD, the phenomenon involves the breakage of Si-H bonds by high-energy hot carriers, forming interface states that induce degradation in the threshold voltage and mobility [ 56 , 57 , 58 ]. As device nodes advance and carrier energy decreases, electron–electron scattering (EES) and multiple vibration excitation (MVE) mechanisms have been proposed to explain the contributions of low-energy carriers to HCD [ 59 , 60 , 61 ]. Simultaneously, the contribution of oxide trap-induced degradation in HCD becomes more pronounced, especially in FinFET devices, where HCD is considered a combined effect of oxide traps and interface states [ 62 , 63 ].…”