CMOS- compatible fabrication method of graphene-based micro devices

Koczorowski, Wojciech; Kuświk, Piotr; Przychodnia, Marta; Wiesner, Klaudia; El-Ahmar, Semir; Szybowicz, Mirosław; Nowicki, Marek; Strupiński, Włodek; Czajka, Ryszard

doi:10.1016/j.mssp.2017.05.021

Cited by 17 publications

(8 citation statements)

References 46 publications

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“…Detailed parameters of photolithography process can be found in Ref. 26 . We chose rather large size of the squares to provide a high signal-to-noise ratio in the latter measurements.…”

Section: Structural Characterization Of Both Samples Was Performed By...mentioning

confidence: 99%

Ultra-low damping in lift-off structured yttrium iron garnet thin films

Krysztofik

Coy

Kuświk

et al. 2017

Applied Physics Letters

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We show that using maskless photolithography and the lift-off technique patterned yttrium iron garnet thin films possessing ultra-low Gilbert damping can be accomplished. The films of the 70 nm thickness were grown on (001)-oriented gadolinium gallium garnet by means of pulsed laser deposition and exhibit high crystalline quality, low surface roughness and effective magnetization of 127 emu/cm 3 . The Gilbert damping parameter is as low as 5 × 10 −4 . The obtained structures have well-defined sharp edges which along with good structural and magnetic film properties, pave a path in the fabrication of high-quality magnonic circuits as well as oxide-based spintronic devices.Yttrium iron garnet (Y 3 Fe 5 O 12 , YIG) has become an intensively studied material in recent years due to exceptionally low damping of magnetization precession and electrical insulation enabling its application in research on spin-wave propagation 1-3 , spin-wave based logic devices 4-6 , spin pumping 7 , and thermally-driven spin caloritronics 8 . These applications inevitably entail film structurization in order to construct complex integrated devices. However, the fabrication of high-quality thin YIG films requires deposition temperatures over 500C 6,[9][10][11][12][13][14][15][16][17][18] leading to top-down lithographical approach that is ion-beam etching of a previously deposited plain film whereas patterned resist layer serves as a mask.Consequently, this method introduces crystallographic defects, imperfections to surface structure and, in the case of YIG films, causes significant increase of the damping parameter. [19][20][21] Moreover, it does not ensure well-defined structure edges for insulators, which play a crucial role in devices utilizing

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“…Detailed parameters of photolithography process can be found in Ref. 26 . We chose rather large size of the squares to provide a high signal-to-noise ratio in the latter measurements.…”

Section: Structural Characterization Of Both Samples Was Performed By...mentioning

confidence: 99%

Ultra-low damping in lift-off structured yttrium iron garnet thin films

Krysztofik

Coy

Kuświk

et al. 2017

Applied Physics Letters

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“…For SW excitation a coplanar waveguide (CPW) made from Cu(150 nm)/Al(10 nm) with a 2 µm wide signal line was fabricated on top of the structure using direct laser lithography and a lift-off technique 30 . The CPW lines are aligned along the NWs axis to excite a dynamic magnetic field with a component perpendicular to the array (x-axis).…”

Section: A Sample Preparationmentioning

confidence: 99%

Magnons in a Quasicrystal: Propagation, Extinction, and Localization of Spin Waves in Fibonacci Structures

et al. 2019

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Magnonic quasicrystals exceed the possibilities of spin wave (SW) manipulation offered by regular magnonic crystals, because of their more complex SW spectra with fractal characteristics. Here, we report the direct X-ray microscopic observation of propagating SWs in a magnonic quasicrystal, consisting of dipolar coupled permalloy nanowires arranged in a one-dimensional Fibonacci sequence. SWs from the first and second band as well as evanescent waves from the band gap between them are imaged. Moreover, additional mini-band gaps in the spectrum are demonstrated, directly indicating an influence of the quasiperiodicity of the system. Finally, the localization of SW modes within the Fibonacci crystal is shown. The experimental results are interpreted using numerical calculations and we deduce a simple model to estimate the frequency position of the magnonic gaps in quasiperiodic structures. The demonstrated features of SW spectra in one-dimensional magnonic quasicrystals allows utilizing this class of metamaterials for magnonics and makes them an ideal basis for future applications.

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“…[ 8,9 ] Compared with conventional semiconductor materials, such as AlGaN, [ 10 ] Si, [ 11 ] Ge, [ 12 ] GaAs, [ 13 ] and PdS, [ 14 ] graphene has ultra‐broadband absorption, because the intrinsic generation of hot carriers could break the bandwidth confinement of photodetection, showing broadband response from visible to infrared regions. [ 15 ] Recently, wafer‐scale fabrication of graphene has been realized [ 16 ] with a production cost lower than that of conventional III–V semiconductors, in which the later are generally grown by expensive and sophisticated epitaxial equipments. [ 17 ] Unlike some traditional semiconductor materials which contain hazardous elements, such as As and Pd, [ 18 ] graphene is environmentally friendly.…”

Section: Introductionmentioning

confidence: 99%

Wafer‐Scale Fabrication of Graphene‐Based Plasmonic Photodetector with Polarization‐Sensitive, Broadband, and Enhanced Response

Fan

Sun

Shi

et al. 2023

Advanced Optical Materials

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Graphene‐based photodetectors draw tremendous interests for broadband photodetection in optical communications, sensing, and hyperspectral imaging. However, the extremely low light absorption coefficient of graphene posts a great challenge for high‐efficiency photodetection. Although plasmonic nanostructures provide resonant absorption enhancement and impressive responsivity, the current fabrication techniques suffer from being time‐consuming, low‐yield, and potentially high‐cost. In this work, a wafer‐scale graphene‐Au nanogratings (Gra‐Au NGs) plasmonic photodetector array is fabricated via two‐beam holographic lithography, which achieves a photosensitive area of 1 mm2, showing balanced abilities of polarization‐sensitive, broadband, and enhanced photoresponse from visible to near‐infrared regions. The maximum polarization extinction ratio and responsivity of the Gra‐Au NGs photodetector reach 6.65 and 2.95 mA W−1. The surface plasmon resonance of Au NGs and near‐field coupling with graphene render strong electric field confinement and enhanced light absorption, which improve the device photoresponse and polarization sensitivity. The hot electrons generation and transportation models in the Gra‐Au NGs heterojunction are proposed, perfectly matching with the photocurrent mapping and equalized energy band distribution. This work enlightens the wafer‐scale fabrication of graphene‐based plasmonic photodetectors, and it can trigger the advances of free‐space detection, such as remote sensing and satellite communication.

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CMOS- compatible fabrication method of graphene-based micro devices

Cited by 17 publications

References 46 publications

Ultra-low damping in lift-off structured yttrium iron garnet thin films

Ultra-low damping in lift-off structured yttrium iron garnet thin films

Magnons in a Quasicrystal: Propagation, Extinction, and Localization of Spin Waves in Fibonacci Structures

Wafer‐Scale Fabrication of Graphene‐Based Plasmonic Photodetector with Polarization‐Sensitive, Broadband, and Enhanced Response

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