2006
DOI: 10.1063/1.2401496
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ClusterBoron™ Implants on a High Current Implanter

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(1 citation statement)
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“…Molecular carbon ion implantation was carried out on a batch implanter modified to accept a special ion source capable of running bibenzyl as source-feed material. The source and its applications to molecular ion implantation are discussed in separate work (6)(7)(8). Atomic carbon and two molecular species were implanted: C 7 H 7 + and C 14 H 14 + .…”
Section: Methodsmentioning
confidence: 99%
“…Molecular carbon ion implantation was carried out on a batch implanter modified to accept a special ion source capable of running bibenzyl as source-feed material. The source and its applications to molecular ion implantation are discussed in separate work (6)(7)(8). Atomic carbon and two molecular species were implanted: C 7 H 7 + and C 14 H 14 + .…”
Section: Methodsmentioning
confidence: 99%