The platform will undergo maintenance on Sep 14 at about 7:45 AM EST and will be unavailable for approximately 2 hours.
1979
DOI: 10.1149/1.2129211
|View full text |Cite
|
Sign up to set email alerts
|

Closure to “Discussion of ‘Breakdown and Efficiency of Anodic Oxide Growth on Titanium’ [ C. K. Dyer and J. S. L. Leach (pp. 1032–1038, Vol. 125, No. 7)]”

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

5
59
0

Year Published

1985
1985
2013
2013

Publication Types

Select...
9

Relationship

0
9

Authors

Journals

citations
Cited by 40 publications
(64 citation statements)
references
References 0 publications
5
59
0
Order By: Relevance
“…The thermally oxidized surface layer corresponding to the rutile structure, as shown in Fig. 2, reveals that the oxide is denser than that developed during naturally formed, HNO3 passivated, or anodization like other researchers [15,16]. Thus the change to a very low current density after thermal heat treatment is related to formation of a surface titanium oxide layer of rutile or a phase transformation from anatase to a rutile structure that has a more compact structural configuration and might therefore be expected to display enhanced resistance to chemical dissolution such as in a biological environment.…”
Section: Measurement Of Cell Proliferationsupporting
confidence: 51%
“…The thermally oxidized surface layer corresponding to the rutile structure, as shown in Fig. 2, reveals that the oxide is denser than that developed during naturally formed, HNO3 passivated, or anodization like other researchers [15,16]. Thus the change to a very low current density after thermal heat treatment is related to formation of a surface titanium oxide layer of rutile or a phase transformation from anatase to a rutile structure that has a more compact structural configuration and might therefore be expected to display enhanced resistance to chemical dissolution such as in a biological environment.…”
Section: Measurement Of Cell Proliferationsupporting
confidence: 51%
“…We propose that the underpotential deposition of deuterium occurs in the −0.3 to −0.4 V SCE potential range under these conditions: [4] where D ads is a surface-adsorbed D atom. 37 Existence of a range of potentials where the cathodic polarization is sufficient to reduce H + to H ads but not for H 2 evolution is well documented for Pt and Pd. 38 For Pt, underpotential-deposited H ads atoms eventually cover the whole electrode surface, and the cell current falls to zero.…”
Section: Discussionmentioning
confidence: 99%
“…7 corresponds to a value of (Qr/Qf) = 0.25, which indicates that one atom of hydrogen is absorbed for one Ti(IV) ion in the film according to the reaction of TiO~ + H + + e ~ TiOOH at the potential of -0.90V, independent of the film thickness. From the reoxidation charge, Qr, for the oxide film reduced at various cathodic potentials, the composition change of the oxide film during the reduction can be evaluated as a function of the cathodic potential, in which the following cathodic reaction is assumed TiO~ + xH+a,, + xe ~ TiQc.r(OH).r [3] The results are given in Fig. 8 for the oxide films 18.0 nm and 27.5 nm thick.…”
Section: Iii) Ions In Acidic Solutionmentioning
confidence: 99%