Clinical diagnosis of recurrent caries

Mjör, Ivar A.

doi:10.14219/jada.archive.2005.0057

Cited by 225 publications

(223 citation statements)

References 36 publications

Supporting

Mentioning

187

Contrasting

Unclassified

Order By: Relevance

“…This could be attributed to the decreased light intensity of the light source, as a consequence of increasing the distance [32,33]. It was reported that it was not possible to predict the light intensity at 10 mm distance from its measurement at 0 mm distance [36]. In the current study, this means that the linear decrease in the light intensity up to 10 mm distance of light source does not depend on its light intensity at the 1 mm distance.…”

Section: Discussionmentioning

confidence: 49%

“…As this distance increases, the irradiance rapidly decreases [30,[32][33][34][35]. This problem is often encountered in class II cavities, as the gingival floor of the cavity is the common site of restoration failure [36]. Appropriate light intensity should always be considered when choosing a polymerization unit so that the resin composite restoration could exhibit good clinical results [37].…”

Section: Discussionmentioning

confidence: 99%

See 1 more Smart Citation

Effect of polymerization protocol on the degree of conversion of photo- and dual-polymerized self-etch adhesives

Moharam¹,

Botros

El-Askary

et al. 2015

Journal of Adhesion Science and Technology

View full text Add to dashboard Cite

(2016). Effect of polymerization protocol on the degree of conversion of photo-and dual-polymerized self-etch adhesives. Journal of Adhesion Science and Technology, 30(3) Bond Universal DC, 3M ESPE) were tested. All adhesives were applied on potassium bromide pellets (KBr) following the manufacturer's instructions. The KBr pellets were divided into 10 experimental groups for the photo-polymerized adhesives and 12 experimental groups for the dual-polymerized adhesives according to the two levels of the study, Level 1: Polymerization protocol and Level 2: Adhesive system. For the photo-polymerized adhesives, the adhesives were polymerized either at 1 mm or 10 mm from the KBr pellets. For the photo-polymerized adhesives, the adhesives were photo-polymerized either at 1 mm or 10 mm distance or polymerized chemically. The DC% of the unpolymerized and polymerized adhesives was assessed using Fourier transform infrared spectroscopy (FTIR). Data were analyzed using two-Way ANOVA to evaluate the effect of polymerization protocol, adhesive system and their interaction on the DC% of the self-etch adhesives. For the photo-polymerized and dual-polymerized adhesives, one-Way ANOVA and Tukey HSD post hoc test was used to evaluate the effect of adhesive system within each polymerization protocol and the effect of polymerization protocol within each adhesive for the dual-polymerized adhesives (p=0.05). Student t-test was used to compare the effect of polymerization distances within each photo-polymerized adhesive. For both photo-and dual-polymerized adhesives, the polymerization protocol and adhesive system had a significant effect on the DC (p=0.000). The interaction between the two factors (polymerization protocol and adhesive system) revealed also a significant effect on the DC% of the different 3 adhesives (p=0.000). Polymerization distance of 1 mm showed significantly higher DC% compared to 10 mm distance. When the dual-polymerized adhesives were left to set chemically, they showed the lowest DC% among all polymerization protocols. DC varied depending on the chemical composition of the self-etch adhesives. The tip of the polymerization device should be positioned as close as possible to the surface to achieve higher DC% of the tested adhesives. Photo-polymerization of the dualpolymerized self-etch adhesives is a mandatory step to improve their DC.

show abstract

Section: Discussionmentioning

confidence: 49%

Section: Discussionmentioning

confidence: 99%

Effect of polymerization protocol on the degree of conversion of photo- and dual-polymerized self-etch adhesives

Moharam¹,

Botros

El-Askary

et al. 2015

Journal of Adhesion Science and Technology

View full text Add to dashboard Cite

show abstract

“…These stresses are undesirable because they are associated with defects, post-operative sensitivity, and secondary caries. [3][4][5] In the past few years, several strategies have been undertaken to develop dental resin systems with reduced shrinkage. One was the preparation of oligomers of methyl methacrylate with higher molecular weights than the BIS-GMA-based systems.…”

Section: Introductionmentioning

confidence: 99%

The effect of a dithiol spiroorthocarbonate on mechanical properties and shrinkage of a dental resin

Ortiz

Gómez

Duarte

et al. 2014

Designed Monomers and Polymers

View full text Add to dashboard Cite

A novel spiroorthocarbonate with two thiol groups (SOC DITHIOL) was synthesized. This monomer was formulated with dimethacrylate monomers used in dental resins and photopolymerized with an LED dental lamp. The presence of the thiol groups in the monomer enabled it to react with the double bonds of the dimethacrylate monomers by means of the thiol-ene mechanism. Additionally, the SOC DITHIOL underwent cationic ring-opening polymerization, producing the corresponding poly(ether-carbonates). SOC DITHIOL was added to a formulation of a conventional acrylic resin, which includes a mixture of dimethacrylate monomers [glycerolate bisphenol A dimethacrylate (BIS-GMA)/ urethane dimethacrylate (UDMA)/triethyleneglycol dimethacrylate (TEGDMA)] in 50/30/20 M ratio). Concentration of the prepared SOC was varied in the above dimethacrylate formulation in the range of 5-30 mol%. Kinetics of photopolymerization were determined by means of real time Fourier transform infrared spectroscopy, finding that increasing concentrations of the SOC DITHIOL in the formulations, not only did not affect the photopolymerization rate of the acrylic resins, but it helped to increase the final conversion of the methacrylate groups. It was also found that the presence of SOC DITHIOL increased the elastic modulus of the resulting cross-linked polymer. The addition of 30% of SOC DITHIOL reduced shrinkage 59% in comparison with a sample without the SOC.

show abstract

“…The maintenance of gingival health and longevity of a dental prosthesis have a closely relation to these marginal sealing [9][10][11][12]. The line cementation interface should receive careful attention from the clinician, because oral fluids and acid bacteria might promote dissolution of the cement agent, resulting in a worst gap quality [13,14] that could be a crevice for bacteria biofilm accumulation promoting secondary caries and periodontal diseases, reducing the longevity of restoration [12,15,16]. Factors as: cementation thickness line, preparation teeth design, finish line angulations, selected restoration material and processing method are essential for the success of prosthetic treatments [17].…”

Section: Introductionmentioning

confidence: 99%

Impact of excess cement removal on vertical misfit and cement line quality in onlays

Soares¹,

Inoue²,

Naves³

et al. 2012

BDS

View full text Add to dashboard Cite

Aim: To evaluate the vertical misfit and cement line quality of partial ceramic restorations cemented with resin luting cements using two different methods for cement remove excess. Materials & Methods: Lithium di-silicate restorations were fabricated and cemented at 24 human molars that receive onlay type preparations. The specimens were randomly divided in two groups (n=12): Group 1 (G1) where the cement excess was removed at pre-gel stage and Group 2 (G2) with the cement excess removed after the polymerization. The vertical misfits at cement line were measurements twice, before and after cementation. Epoxy resin replicas of the specimens were obtained and the cement line quality was analyzed with the scanning electron microscope before and after the finishing and polishing procedures and classified as unsatisfactory, acceptable or good conditions. The vertical misfits values were submitted to Student test (p<0.05) and the quality line data were analyzed with Mann-Whitney for independent samples (p<0.05) and Wilcoxon test for paired specimens (p<0.05).Results: The statistical analysis showed that vertical misfit and the cement line quality presented no difference values to G1 and G2. However, finishing and polishing procedures affect positively the cement line quality in the both groups. Conclusion: The excess cement removal methods had no influence on the vertical misfit and cement line quality for the restorations. The finishing and polishing procedures improved the cement line quality in both groups.

show abstract

Clinical diagnosis of recurrent caries

Cited by 225 publications

References 36 publications

Effect of polymerization protocol on the degree of conversion of photo- and dual-polymerized self-etch adhesives

Effect of polymerization protocol on the degree of conversion of photo- and dual-polymerized self-etch adhesives

The effect of a dithiol spiroorthocarbonate on mechanical properties and shrinkage of a dental resin

Impact of excess cement removal on vertical misfit and cement line quality in onlays

Contact Info

Product

Resources

About