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2003
DOI: 10.1016/s0040-6090(03)00249-9
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CIS module pilot processing applying concurrent rapid selenization and sulfurization of large area thin film precursors

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Cited by 65 publications
(31 citation statements)
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“…To compare, typical uniformities expected from co-evaporation inline system are in the 5% range [ 63 ] while the uniformity of the two-step sputtering processes have been reported in the range of 2%. [ 64 ] Taking into account the above arguments, the ED of individual metallic layers from water-based solutions with a subsequent annealing in a chalcogen atmosphere is suitable to obtain high-quality CIGS layers in an industrially scalable manner.…”
Section: Cigsmentioning
confidence: 99%
“…To compare, typical uniformities expected from co-evaporation inline system are in the 5% range [ 63 ] while the uniformity of the two-step sputtering processes have been reported in the range of 2%. [ 64 ] Taking into account the above arguments, the ED of individual metallic layers from water-based solutions with a subsequent annealing in a chalcogen atmosphere is suitable to obtain high-quality CIGS layers in an industrially scalable manner.…”
Section: Cigsmentioning
confidence: 99%
“…As described in Section 1.2.3 , CIGS can be formed by annealing thin fi lms of the metal elements in a chalcogen atmosphere: the Showa -Shell -Siemens industrial process is based on this route [80,81] . Whether a stack of metals or an alloy layer is used depends in part on the annealing process.…”
Section: Cu(inga)se 2 Via Stacked Metal Layersmentioning
confidence: 99%
“…Process development primarily during the third subcontract phase emphasized demonstration and implementation of a "sputter dose" process developed by our Munich R&D colleagues [14]. As implemented at SSI, a compound containing sodium is sputtered on the Mo base electrodes prior to deposition of nominally standard precursors and the precursors are processed through nominally the baseline SSI process.…”
Section: Technical Review Capacity and Product Line Expansion Overviementioning
confidence: 99%