The ability to provide surfaces with spatially controlled chemical properties is one of the key ingredients for many applications, ranging from the design of chemical, biochemical and biological sensors [1,2] to the control of surface properties at the nanoscale such as friction, wettability [3] or protein interaction. [4] Several approaches have been proposed and demonstrated so far: from electrochemical control of biomolecular self-assembly, [5] gold-thiol interactions, [2] to local top-down lithography and silanization, [6] photothermal nanopatterning [7] and chemomechanical functionalization.[8]Recently we proposed an alternative functionalization method [9] that shares with the chemomechanical patterning described in ref.[8] the concept of mechanical modification inside a reactive medium but is intrinsically self-aligned with pre-nanofabricated structures. We used silicon sacrificial structures, fabricated for this purpose, that we cleaved inside a reactive medium, exploiting the reactivity of the freshly cleaved surface, thus generating a chemically functionalized structure at a predefined location of a device with arbitrary shape and size, with the only constraint being the fundamental limits imposed by the lithographic techniques. This approach is fully compatible with standard MEMS production technology, since the functionalization can be performed as a last step as we demonstrated in reference ref. [9].Herein we report on the chemical and physical properties of the chemical bonds originating during the cleaving in a reactive environment and we provide the evidence that our process results in an effective covalent bonding of the functional molecules with the silicon substrate.In order to investigate the chemical process that occurs at the silicon surface during the cleaving process, photoemission spectroscopy (PES) with high energy resolution is the best choice, for its surface sensitivity and its powerful discrimination between different chemical bonds that can be energetically separated by only a few hundreds of meV. On the other hand, ultrasound-assisted cleavage occurs only for micron-sized structures and a spatially resolved technique should be used, which excludes other spectroscopies such as infrared-based techniques. The sample consisted of high-density pillar structures, designed to offer the maximum cleaved area to oxidized area ratio, which resulted in a 1:4 ratio, as shown in Figures 1 a,b. A detailed description of the fabrication procedure has been published elsewhere [10] and is summarized in the Experimental Section. Before cleaving, Au was evaporated on the pillar area in order to obtain a higher spectroscopic contrast. However, for geometrical reasons gold did not cover entirely the sample.[7] Samples were cleaved and the exposed surface was functionalized with 1H,1H,2H,2H-perfluorodecyl acrylate (PFA) using the procedure described in the Experimental Section. As a result the sample surface consisted of three main typologies: 1) clean, freshly cleaved, functionalized, (111) silicon sur...