ChemInform Abstract: THERMISCHE STABILITAET VON VANADINHALTIGEM SILICIUMDIOXID

Kol'tsov, S. I.; Малыгин, А. А.; Volkova, A. N.; Aleskovskii, V. B.

doi:10.1002/chin.197446055

Cited by 7 publications

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“…Russians commonly refer to the technology as molecular layering (ML), Europeans have traditionally referred to the technology as atomic layer epitaxy (ALE), and most non‐Russians now refer to it as atomic layer deposition (ALD). The first publications mentioning the molecular layering technique (ML) appeared in the 1960s . Many of the first publications appeared only in local editions of abstract books from scientific and technical conferences at the Leningrad Technological Institute by Lensovet (LTI by Lensovet) and were, therefore, difficult to access.…”

Section: Introductionmentioning

confidence: 99%

From V. B. Aleskovskii's “Framework” Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition

Малыгин

Дрозд

Малков

et al. 2015

Chemical Vapor Deposition

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This essay is dedicated to the history of creation and development of the molecular layering technique (ML) which, in the modern community of non-Russian scientists, is commonly referred to as atomic layer deposition (ALD). Basic research in the field of chemical transformations of solid surfaces using the ML method in the light of the "framework" hypothesis proposed by V. B. Aleskovskii in 1952 is discussed. A number of questions raised by international scientists including those involved in the Virtual Project on the History of ALD (VPHA, 2013), and scientists from conferences in Helsinki (Finland, May 2014.), Kyoto (Japan, June 2014), and personal communications amongst peers are addressed. For the first time in English, this article provides information about V. B. Aleskovskii and S. I. Kol'tsov who are closely associated with development of the ML technique in the Soviet Union. This paper also informs the scientific community about research groups currently engaged in ML research in Russia and introduces the scientific school of "Chemistry of highly organized substances", founded and supervised by V. B. Aleskovskii.

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Section: Introductionmentioning

confidence: 99%

From V. B. Aleskovskii's “Framework” Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition

Малыгин

Дрозд

Малков

et al. 2015

Chemical Vapor Deposition

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“…The parameter n is used to evaluate the functionality of a surface group, i.e., the number of bonds between this group and the initial silica matrix. The functionality of titanium oxochloride surface structures formed in TiCl 4 chemisorption largely depends on the initial concentration of silanol groups, which is determined by the temperature T 0 of preliminary annealing of silica [2]. A review of the available experimental data on the influence exerted by T 0 on the nature of TiCl 4 chemisorption makes it possible to reveal the general pattern consisting in that the Cl/Ti ratio in surface groups increases from 1 to 3 as the concentration of =Si3OH decreases (with increasing T 0 ) [2,6].…”

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“…The spectra were measured in situ in a flow-through reactor combined with a quartz cuvette with KBr windows [10]. The synthesis products were analyzed for the content of titanium(IV) [2,20] and chloride ions [21]. To obtain the true stoichiometric ratios, the content of titanium(IV), chloride ions, and OH groups was recalculated to 1 g of anhydrous silica (to 1 g 0 ) [2].…”

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confidence: 99%

“…The synthesis products were analyzed for the content of titanium(IV) [2,20] and chloride ions [21]. To obtain the true stoichiometric ratios, the content of titanium(IV), chloride ions, and OH groups was recalculated to 1 g of anhydrous silica (to 1 g 0 ) [2]. Table 1 lists the chemical composition of products formed in interaction at various T CS between TiCl 4 vapor and silica subjected to a preliminary thermal treatment at 600oC.…”

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Thermal Transformations of Titanium Oxochloride Nanostructures on Silica Surface

2005

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“…Recently, thin oxide layers (oxide nanostructures) have been increasingly applied for the production of highly active catalysts, ion-selective field-effect transistors, and other microelectronic devices. The method of molecular layer-by-layer deposition (MLD) from the gas phase allow one to produce one-and multicomponent element-oxygen nanostructures of different thicknesses on solid substrates [1][2][3][4][5][6][7][8][9]. Previously, we studied the electrosurface characteristics of one-component nanostructures synthesized on oxide substrates with the involvement of hydroxy and methoxy functional groups [10][11][12][13][14][15][16].…”

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Synthesis and Electrosurface Properties of One- and Two-Component Nanostructures

et al. 2005

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The interest in the study of the formation mechanisms and the structure of electrical double layers (EDL) at oxide-electrolyte solution interfaces is predetermined by both the abundance of oxides in the nature and their use in practice. Recently, thin oxide layers (oxide nanostructures) have been increasingly applied for the production of highly active catalysts, ion-selective field-effect transistors, and other microelectronic devices. The method of molecular layer-by-layer deposition (MLD) from the gas phase allow one to produce one-and multicomponent element-oxygen nanostructures of different thicknesses on solid substrates [1-9]. Previously, we studied the electrosurface characteristics of one-component nanostructures synthesized on oxide substrates with the involvement of hydroxy and methoxy functional groups [10][11][12][13][14][15][16]. Data on electrosurface properties of composite (multicomponent) nanostructures are unavailable in the literature. Therefore, the goal of this work was the synthesis, study, and comparison of electrosurface properties of one-and two-component Al-and Ti-based nanostructures formed as films of different thicknesses on oxide substrates. In addition, colloidal characteristics of element-oxygen nanostructures of different compositions were compared with those of the substrates and corresponding bulk (hydr)oxides.One-and two-component nanostructures were synthesized with the involvement of hydroxy functional groups according to the following reactions (with the reference to a silica substrate):where E = Al or Ti.Samples were prepared in a flow of air, which was preliminarily dried over phosphorous oxide to a residual moisture content of 2 mg/m 3 . The dried air was saturated with either titanium chloride vapor or the vapor of solid aluminum chloride heated to 200°ë . After the excess of hydrogen chloride was removed with the dried air, the reaction product was treated with water vapor at 200°ë until HCl escaped from the reactor. In order to maintain a specified temperature in the reaction zone, a Nichrome wire was used, to which a necessary voltage was applied. The temperature was measured with a thermocouple.Aluminum-and titanium-oxygen nanostructures of different thicknesses, which were set by number n of the cycles of surface reactions (1) and (2), were synthesized on silicon oxide and aluminum hydroxide substrates. Hereafter, these structures are conventionally designated as n Al 2 O 3 / SiO 2 , n TiO 2 / AlOOH, and n TiO 2 /5 Al 2 O 3 / SiO 2 .Aerosil OX-50 (Degussa) (with a specific surface area S 0 = 42.5 m 2 /g, as determined by the BET method using the thermal desorption of argon with chromatographic recording) and a plane-parallel quartz capillary were used as silicon oxide substrates. The plane-parallel capillary was formed by the plates of KU quartz glass whose inner surfaces were preliminarily ground and polished (14th class). The size of asperities on SiO 2 plates did not exceed 0.1 µ m. Capillary length (5.8 cm) was determined by the geometric sizes of an initial pl...

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ChemInform Abstract: THERMISCHE STABILITAET VON VANADINHALTIGEM SILICIUMDIOXID

Abstract: Hydroxid‐Oberflächengiuppen von Silicagel reagieren mit VOCl3 zu einem Silicagelderivat, bei dem bis zu 97% der Hydroxid‐Oberflächengruppen durch (‐Si‐O‐)3VO‐ Gruppen ersetzt sein können.

Cited by 7 publications

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From V. B. Aleskovskii's “Framework” Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition

From V. B. Aleskovskii's “Framework” Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition

Thermal Transformations of Titanium Oxochloride Nanostructures on Silica Surface

Synthesis and Electrosurface Properties of One- and Two-Component Nanostructures

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