1986
DOI: 10.1002/chin.198639131
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ChemInform Abstract: Thermal Decomposition of Trimethyl‐ and Triethylarsine in the Gas Phase.

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“…[49] The thermal decomposition of triethylbismuth at 200 °C leads to the formation of ethylene, butane and butenes as major gaseous products, suggesting the formation of ethyl radicals via homolysis of the BiÀ C(sp 3 ) carbon bonds (Scheme 4, top). [50] Besides thermal homolysis, early work in the 1960s showed that the BiÀ C(sp 2 ) bond in BiPh 3 can also be homolyzed under UV light irradiation, releasing phenyl radicals. These ensuing radicals were subsequently trapped by (hetero)aromatic toluene and pyridine, giving products of phenylation, benzene and metallic bismuth (Scheme 4, bottom).…”
Section: Historical Perspectivementioning
confidence: 99%
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“…[49] The thermal decomposition of triethylbismuth at 200 °C leads to the formation of ethylene, butane and butenes as major gaseous products, suggesting the formation of ethyl radicals via homolysis of the BiÀ C(sp 3 ) carbon bonds (Scheme 4, top). [50] Besides thermal homolysis, early work in the 1960s showed that the BiÀ C(sp 2 ) bond in BiPh 3 can also be homolyzed under UV light irradiation, releasing phenyl radicals. These ensuing radicals were subsequently trapped by (hetero)aromatic toluene and pyridine, giving products of phenylation, benzene and metallic bismuth (Scheme 4, bottom).…”
Section: Historical Perspectivementioning
confidence: 99%
“…As described in the first two sections, Bi−E bonds have been established for a long time to be relatively weak [38,50–52,72] . This weakness arises from the minimal overlap of the large and diffuse orbitals of bismuth, and hence, results on facile homolytic cleavages that can happen under both thermal or photochemical conditions.…”
Section: Generation Characterization and Properties Of Bismuth Radicalsmentioning
confidence: 99%
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“…As described in the first two sections, BiÀ E bonds have been established for a long time to be relatively weak. [38,[50][51][52]72] This weakness arises from the minimal overlap of the large and diffuse orbitals of bismuth, and hence, results on facile homolytic cleavages that can happen under both thermal or photochemical conditions. Indeed, many Bi(III) compounds have been identified as photosensitive or unstable at room temperature, such as BiCp 3 , [73] and Bi(NMe 2 ) 3 , [74] among others.…”
Section: Generation Of Bismuth Radicals Via Homolysis Of Bi(iii)à E B...mentioning
confidence: 99%