1998
DOI: 10.1002/chin.199821229
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ChemInform Abstract: High‐Temperature Wet Chemical Etching of Ta2O5 in NaOH‐Based Solutions for Fabricating Antiresonant Reflecting Optical Waveguides.

Abstract: High-Temperature Wet Chemical Etching of Ta 2 O 5 in NaOH-Based Solutions for Fabricating Antiresonant Reflecting Optical Waveguides. -The Ta 2 O 5 dielectric films are formed by magnetron RF sputtering technique on Si. Etching without insoluble residues occurs by use of NaOH/H 2 O 2 etchant. The etching rates are increased to 5 µm/min with satisfactory undercut control achieved at an etchant temp. of 130 • C. Ta 2 O 5 ARROW-type waveguides with ridge widths ranging from 5 to 20 µm are fabricated. -(CHUANG, M.… Show more

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“…Therefore, it is desired to find low-cost solutions to etch waveguide materials. Wet-chemical etching is one of the economical methods for the development of photonic circuits [29]. Though, the optical films structured with this practice offer rounded side walls due to the isotropic nature of etching [30].…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, it is desired to find low-cost solutions to etch waveguide materials. Wet-chemical etching is one of the economical methods for the development of photonic circuits [29]. Though, the optical films structured with this practice offer rounded side walls due to the isotropic nature of etching [30].…”
Section: Introductionmentioning
confidence: 99%