1989
DOI: 10.1002/chin.198908108
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ChemInform Abstract: Chemistry of the Oxidation of Gaseous Mixtures of C2F3Cl3, SiCl4, GeCl4, and POCl3 at High Temperatures

Abstract: ChemInform Abstract (oxidation of CF2Cl-CFCl2 in a quartz glass reactor in the presence of SiCl4 in part with the addition of POCl3 and GeCl4; IR of the effluent gases; evidence for the intermediates CO, COF2, COFCl, and CF4 at 1273 K and for the final products CO2, Cl2, SiF4 (and POF3 and GeF4) at 2223 K; influence of the flow velocity on the product distribution).

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