Chemically vapor deposited diamond as a cutting tool material— a study of failure mechanisms

Reineck, I.; Söderberg, Staffan; Ekholm, Per-Erik; Westergren, Kenneth

doi:10.1016/0257-8972(93)90335-l

Cited by 39 publications

(6 citation statements)

References 3 publications

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“…In general, the adhesion of the diamond films to the substrates is poor and the nucleation density is very low [44][45][46][47][48][49][50][51]. Mainly refractory materials such as W (WC-Co), Mo, and Si have been used as substrate materials.…”

Section: Selection Of Substrate Materialsmentioning

confidence: 99%

“…However, deposition of adherent high-quality diamond films onto substrates such as cemented carbides, stainless steel, and various metal alloys containing transition element has proved to be problematic. In general, the adhesion of the diamond films to the substrates is poor and the nucleation density is very low [44][45][46][47][48][49][50]. WC-Co tools contain 6% Co and 94% WC substrate with grain size 1-3 micron is desirable for diamond coatings.…”

Section: (B) Pre-treatment On Wc-co Substratementioning

confidence: 99%

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Micro and Nanomanufacturing

2007

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Section: Selection Of Substrate Materialsmentioning

confidence: 99%

Section: (B) Pre-treatment On Wc-co Substratementioning

confidence: 99%

Micro and Nanomanufacturing

2007

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“…Poor adhesion of the diamond coating is the main technical barriers for commercialization of diamond-coated tools [1][2][3][4]. During high temperature deposition of diamond coating, Co leaching from WC-Co substrate catalyzes the formation of sp 2 -bonded (non-diamond) carbon, instead of sp 3 -bonded diamond [5].…”

Section: Introductionmentioning

confidence: 99%

Deposition of Adherent Diamond Coatings on WC-Co Substrates

Lev

Lukitsch

et al. 2005

MRS Proc.

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High quality well-adhered microcrystalline diamond coatings have been produced by the microwave plasma enhanced chemical vapor deposition (MPECVD) technique on cemented carbide substrates. A multi-interlayer system Cr/CrN/Cr was deposited on the WC-Co substrate before diamond deposition to work as a diffusion barrier. The coated substrate was peened with friable diamond powder to roughen the surface resulting in high nucleation density. Adherent diamond film has been successfully deposited on the substrate at temperature around 700ºC with 1.0 % CH 4 in Hydrogen plasma. The surface morphology and film structure has been studied by Scanning Electron Microscopy (SEM) and X-Ray diffraction technique. The adhesion of the diamond film has been evaluated by Rockwell indentation tests.

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“…S ILICON NITRIDE (Si 3 N 4 ) based ceramics are considered adequate substrates for growth of chemical vapor deposition (CVD) of diamond films for mechanical applications [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19] since they are hard and tough and, above all, they exhibit a thermal expansion coefficient close to that of diamond. This minimizes the interfacial residual stresses between the film and the substrate and ensures superior adhesion.…”

Section: Introductionmentioning

confidence: 99%

Surface Pretreatments of Silicon Nitride for CVD Diamond Deposition

Belmonte¹,

Silva²,

Fernandes³

et al. 2003

Journal of the American Ceramic Society

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The efficiency of different surface pretreatments (four standard chemical etchings and four diamond powder abrasive procedures) on silicon nitride (Si 3 N 4 ) substrates for chemical vapor deposition (CVD) of diamond has been systematically investigated. Blank Si 3 N 4 samples were polished with colloidal silica (ϳ0.25 m). Diamond nucleation and growth runs were conducted in a microwave plasma chemical vapor deposition apparatus for 10 min and 6 h, respectively. Superior results concerning nucleation density (N d ϳ 10 10 cm ؊2 after 10 min), film uniformity, and grain size (below 2 m after 6 h) were obtained for the mechanically microflawed samples, revealing that chemical etchings (hot and cold strong acids, molten base or CF 4 plasma) are not crucial for good CVD diamond quality on Si 3 N 4 .

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Chemically vapor deposited diamond as a cutting tool material— a study of failure mechanisms

Cited by 39 publications

References 3 publications

Micro and Nanomanufacturing

Micro and Nanomanufacturing

Deposition of Adherent Diamond Coatings on WC-Co Substrates

Surface Pretreatments of Silicon Nitride for CVD Diamond Deposition

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