2023
DOI: 10.1002/adfm.202303520
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Chemical Vapor Deposition Syntheses of Wafer‐Scale 2D Transition Metal Dichalcogenide Films toward Next‐Generation Integrated Circuits Related Applications

Abstract: Abstract2D semiconducting transition metal dichalcogenides (TMDCs), most with a formula of MX2 (M=Mo, W; X=S, Se, etc.), have emerged as promising channel materials for next‐generation integrated circuits, considering their dangling‐bond‐free surfaces, moderate bandgaps, relatively high carrier mobilities, etc. Wafer‐scale preparation of 2D MX2 films holds fundamental significance for realizing their applications. Chemical vapor deposition (CVD) is recognized as the most promising method for preparing electron… Show more

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Cited by 6 publications
(1 citation statement)
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“…It generally involves chemical reactions occurring in the gas atmosphere or at the gas/solid interface, to form the desired materials on heated substrates. In the last decade, CVD has been rapidly developed as a powerful synthetic route for achieving high-quality 2D TMDs [32,33]. The lateral size, thickness, and morphology of CVD-synthesized 2D TMDs can be well controlled through altering the synthetic processes.…”
Section: Chemical Vapor Depositionmentioning
confidence: 99%
“…It generally involves chemical reactions occurring in the gas atmosphere or at the gas/solid interface, to form the desired materials on heated substrates. In the last decade, CVD has been rapidly developed as a powerful synthetic route for achieving high-quality 2D TMDs [32,33]. The lateral size, thickness, and morphology of CVD-synthesized 2D TMDs can be well controlled through altering the synthetic processes.…”
Section: Chemical Vapor Depositionmentioning
confidence: 99%