Chemical vapor deposition of titanium nitride thin films: kinetics and experiments

Su, Juan; Boichot, R.; Blanquet, Elisabeth; Mercier, F.; Pons, M.

doi:10.1039/c9ce00488b

Cited by 28 publications

(18 citation statements)

References 33 publications

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“…Indeed, TiN has intrinsic physico-chemical and optical properties making it first-choice material: low resistivity, high reflectance in the infrared spectral range, good corrosion resistance, good chemical inertness, good thermal stability, and high hardness [4][5][6]. Generally, TiN thin layer is obtained using a wide range of deposition processes requiring vacuum technology, such as reactive magneton sputtering [1,[7][8][9][10], molecular-beam epitaxy [11,12], chemical vapor deposition (CVD) [13][14][15], atomic layer deposition (ALD) [16][17][18][19] or pulsed laser deposition (PLD) [20][21][22], under a nitrogen or ammonia atmosphere. Unfortunately, due to its good hardness and chemical resistance, TiN is not adapted for being micro or nanostructured using standard etching process (Reactive Ion Etching for example).…”

Section: Introductionmentioning

confidence: 99%

Optical, electrical and mechanical properties of TiN thin film obtained from a TiO2 sol-gel coating and rapid thermal nitridation

Valour¹,

Higuita²,

Guillonneau³

et al. 2021

Surface and Coatings Technology

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This study reports the optical, electrical and mechanical properties of TiN films prepared by direct rapid thermal nitridation process from a photo-patternable TiO 2 sol-gel layer. The sol-gel approach is compatible to non-planar and large substrates and allows the micro-nanotexturing of crystallized TiN surfaces in a significantly short time, large scale and at a lower cost compared to TiN layer deposition from existing and conventional processes (CVD, PVD, ALD…). In this paper, the optical measurements are carried out by optical spectroscopy in the UV, visible and near-IR region and by ellipsometry. The resistivity and the conductivity are estimated by four-point probe method, while hardness is characterized by nano-indentation experiments. The results indicate that the TiN thin film made by sol-gel method and rapid thermal nitridation are very promising for the manufacturing of optical metasurfaces devices or new plasmonic materials.

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Section: Introductionmentioning

confidence: 99%

Optical, electrical and mechanical properties of TiN thin film obtained from a TiO2 sol-gel coating and rapid thermal nitridation

Valour¹,

Higuita²,

Guillonneau³

et al. 2021

Surface and Coatings Technology

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“…This excessive heating limits the use of CVD for some technical applications where substrate material cannot tolerate high temperatures. Moreover, it is known that some titanium-based precursors and their by-products are highly corrosive, which lead to various material handling and storage problems [9]. In recent years for the preparation of TiO 2 thin films, PVD methods gained enormous interest since they are not limited to the deposition only at thermodynamically equilibrium and they run at much lower costs in comparison to CVD processes [10].…”

Section: Introductionmentioning

confidence: 99%

Pathways to Tailor Photocatalytic Performance of TiO2 Thin Films Deposited by Reactive Magnetron Sputtering

et al. 2019

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TiO2 thin films are used extensively for a broad range of applications including environmental remediation, self-cleaning technologies (windows, building exteriors, and textiles), water splitting, antibacterial, and biomedical surfaces. While a broad range of methods such as wet-chemical synthesis techniques, chemical vapor deposition (CVD), and physical vapor deposition (PVD) have been developed for preparation of TiO2 thin films, PVD techniques allow a good control of the homogeneity and thickness as well as provide a good film adhesion. On the other hand, the choice of the PVD technique enormously influences the photocatalytic performance of the TiO2 layer to be deposited. Three important parameters play an important role on the photocatalytic performance of TiO2 thin films: first, the different pathways in crystallization (nucleation and growth); second, anatase/rutile formation; and third, surface area at the interface to the reactants. This study aims to provide a review regarding some strategies developed by our research group in recent years to improve the photocatalytic performance of TiO2 thin films. An innovative approach, which uses thermally induced nanocrack networks as an effective tool to enhance the photocatalytic performance of sputter deposited TiO2 thin films, is presented. Plasmonic and non-plasmonic enhancement of photocatalytic performance by decorating TiO2 thin films with metallic nanostructures are also briefly discussed by case studies. In addition to remediation applications, a new approach, which utilizes highly active photocatalytic TiO2 thin film for micro- and nanostructuring, is also presented.

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“…[5,43] Thus, stabilizing the nanostructures without altering their optical/thermal functionality is in high demand. Although there have been detailed studies on the growth of epitaxial TiN, [33,44,45] information on structural properties and thermal stability at extreme temperatures (>1200 °C) is not readily available.…”

Section: Introductionmentioning

confidence: 99%

Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C

Krekeler

Rout

Krishnamurthy

et al. 2021

Advanced Optical Materials

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Titanium nitride (TiN) has emerged as one of the most promising refractory materials for plasmonic and photonic applications at high temperatures due to its prominent optical properties along with mechanical and thermal stability. From a high temperature standpoint, TiN is a substitution for Au and Ag in the visible to near‐infrared wavelength range, with potential applications including thermophotovoltaics, thermoplasmonics, hot‐electron and high temperature reflective coatings. However, the optical properties and thermal stability of TiN films strongly depend on the growth conditions, such as temperature, partial pressure of the reactive ion gas, ion energy, and substrate orientation. In this work, epitaxial TiN films are grown at 835 °C on an Al2O3 substrate using a radio frequency sputtering method. The oxidization behavior of TiN is investigated at 1000 °C under a medium vacuum condition of 2 × 10–3 mbar, which is relevant for practical technical applications, and the thermal stability at 1400 °C under a high vacuum condition of 2 × 10–6 mbar. The TiN film structure shows an unprecedented structural stability at 1000 °C for a minimum duration of 2 h under a medium vacuum condition, and an exceptional thermal stability at 1400 °C, for 8 h under a high vacuum condition, without any protective coating layer. The work reveals, for the first time to the authors’ knowledge, that the TiN film structure with columnar grains exhibits remarkable thermal stability at 1400 °C due to low‐index interfaces and twin boundaries. These findings unlock the fundamental understanding of the TiN material at extreme temperatures and demonstrate a key step towards fabricating thermally stable photonic/plasmonic devices for harsh environments.

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Chemical vapor deposition of titanium nitride thin films: kinetics and experiments

Cited by 28 publications

References 33 publications

Optical, electrical and mechanical properties of TiN thin film obtained from a TiO2 sol-gel coating and rapid thermal nitridation

Optical, electrical and mechanical properties of TiN thin film obtained from a TiO2 sol-gel coating and rapid thermal nitridation

Pathways to Tailor Photocatalytic Performance of TiO2 Thin Films Deposited by Reactive Magnetron Sputtering

Unprecedented Thermal Stability of Plasmonic Titanium Nitride Films up to 1400 °C

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