Chemical vapor deposition of tantalum carbide and carbonitride thin films from Me3CETa(CH2CMe3)3 (E = CH, N)Electronic supplementary information (ESI) available: AFM and SEM images of TaC and TaCN films deposited on Si(100) at 773, 823 and 923 K. See http://www.rsc.org/suppdata/jm/b2/b208129f/

Chang, Yu‐Hsu; Wu, Jin Bao; Chang, Pei Ju; Chiu, Hsin‐Tien

doi:10.1039/b208129f

Cited by 23 publications

(5 citation statements)

References 26 publications

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“…As for the latter two species, Ta 4+ (TaO 2 ) and Ta 5+ (Ta 2 O 5 ), their quite weak peaks probably arise from the surface oxidation of Ta 4 C 3 nanosheets. The binding energy of TaC species, including Ta 4f 7/2 (TaC x ) and Ta 4f 5/2 (TaC x ), matches the previous report on tantalum carbides (Figure b) . The spectrum in the O 1s region was fitted by following components: TaO 2 and/or Ta 2 O 5 , TaC x , Ta 4 C 3 (OH) x , and Ta 4 C 3 (OH) x ‐H 2 O ads .…”

supporting

confidence: 87%

Theranostic 2D Tantalum Carbide (MXene)

et al. 2017

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The large-dimensional and rigid ceramic bulks fabricated by high-temperature solid-phase reaction and sintering have never been considered for possibly entering and circulating within the blood vessels for biomedical applications, especially on combating cancer. Here, it is reported for the first time that MAX ceramic biomaterials exhibit unique functionalities for dual-mode photoacoustic/computed tomography imaging and are highly effective for in vivo photothermal ablation of tumors upon being exfoliated into ultrathin nanosheets within atomic thickness (MXene). As a paradigm, 2D ultrathin tantalum carbide nanosheets (Ta C MXenes) with nanosized lateral sizes are successfully synthesized based on a two-step liquid exfoliation strategy of MAX phase Ta AlC by combined hydrofluoric acid (HF) etching and probe sonication. The structural, electronic, and surface characteristics of the as-exfoliated nanosheets are revealed by various characterizations combined with first-principles calculations via density functional theory. Especially, the superior photothermal-conversion performance (efficiency η of 44.7%) and in vitro/in vivo photothermal ablation of tumor by biocompatible soybean phospholipid-modified Ta C nanosheets are systematically revealed and demonstrated. Based on the large family members of MXenes, this work may offer a paradigm that MXenes can achieve the specific biomedical applications (here, theranostic) providing that their compositions and nanostructures are carefully tuned and optimized to meet the strict requirements of biomedicine.

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confidence: 87%

Theranostic 2D Tantalum Carbide (MXene)

et al. 2017

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“…The Ti 2p shifts were at 458.6 and 455.4 eV for films grown from compounds 1 and 4 , respectively. The C 1s shifts (282.8 eV) correspond to the formation of carbide, and the N 1s, Ti 2p, and C 1s results are in agreement with the values reported for TiC x N y films (lit. , (TiN) 396.9 eV). Overall films grown from 1 have an approximate composition of TiC 0.3 N 0.7 , whereas those from 4 are TiC 0.5 N 0.5 .…”

Section: Resultssupporting

confidence: 90%

“…Treatment of [Ti(NMe 2 ) 2 Cl 2 ] with 1 equiv of [Li{ i -PrNC[N(SiMe 3 ) 2 ]N- i -Pr}] (generated in situ, according to ref ) in diethyl ether at room temperature resulted in the isolation of red crystalline 1 . Analytical and spectroscopic data for 1 were consistent with the formation of the mono(guanidinate) complex [Ti(NMe 2 ) 2 Cl{ i -PrNC[N(SiMe 3 ) 2 ]N- i -Pr}], 1 (Scheme ).…”

Section: Resultsmentioning

confidence: 99%

“…Synthesis of Compound 1. Following literature routes, LiN(SiMe 3 ) 2 (0.85 g, 5.1 mmol) was added to a solution of i -PrNCN- i -Pr (0.80 mL, 5.1 mmol) in diethyl ether (20 mL). A pale yellow solution resulted which was allowed to stir for 4 h. [Ti(NMe 2 ) 2 Cl 2 ] (1.05 g, 5.1 mmol) was then added with stirring at room temperature, which resulted in a color change to dark red.…”

Section: Methodsmentioning

confidence: 99%

“…Synthesis of Compound 2/3. Following modified literature routes, LiN(SiMe 3 ) 2 (0.85 g, 5.1 mmol) was added to a solution of i -PrNCN- i -Pr (0.80 mL, 5.1 mmol) in diethyl ether (20 mL). The reaction mixture was refluxed for 3 h, and a pale yellow solution resulted.…”

Section: Methodsmentioning

confidence: 99%

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Synthesis of Titanium(IV) Guanidinate Complexes and the Formation of Titanium Carbonitride via Low-Pressure Chemical Vapor Deposition

et al. 2005

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The mono(guanidinato) complex [Ti(NMe2)2Cl{i-PrNC[N(SiMe3)2]N-i-Pr}] (1) was prepared by reaction of [Ti(NMe2)2Cl2] with 1 or 2 equiv of the lithium guanidinate salt [Li{i-PrNC[N(SiMe3)2]N-i-Pr}]. Compound 1 has been characterized by X-ray crystallography. Treatment of TiCl4 with 2 equiv of [Li{i-PrNC[N(SiMe3)2]N-i-Pr}] resulted in the formation of dark red crystals. X-ray crystallography showed that these crystals consist of a 70:30 mixture of two bis(guanidinato) complexes, namely, [TiCl2{i-PrNC[N(SiMe3)2]N-i-Pr}{i-PrNC(N=CMe2)N-i-Pr}] (2) and [TiCl2{i-PrNC[N(SiMe3)2]N-i-Pr}{i-PrNC[N(H)-i-Pr]N-i-Pr}] (3). Both compounds 2 and 3 possess a transformed guanidinate ligand. Low-pressure chemical vapor deposition of either compound 1 or [TiCl2{i-PrNC(NMe2)N-i-Pr}] (4) at 600 degrees C results in thin films of titanium carbonitride.

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Metallic Materials Deposition: Metal‐Organic PrecursorsBased in part on the article Metallic Materials Deposition: Metal–Organic Precursors by Herbert D. Kaesz, Alfred Zinn, & Lutz Brandt which appeared in theEncyclopedia of Inorganic Chemistry, First Edition.

Winter

Zheng

El‐Kaderi

2005

Encyclopedia of Inorganic Chemistry

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This review describes metal‐organic precursors for the growth of metal‐containing thin films by chemical vapor deposition methods. The major emphasis is on precursors that have been reported since 1994, and corresponds to a time of major growth in this field. Progress in the development of metal‐organic precursors is documented for the main group, lanthanide, and group 4–11 elements. In the main group elements, there has been considerable research activity directed toward the identification of strontium and barium precursors, due both to the technological importance of mixed oxide phases and the inherent difficulties in obtaining volatile, complexes of these large metal ions. Aluminum, gallium, and indium have also been the subject of intense investigation, owing to the importance of many phases containing these elements. The group 4 and 5 elements titanium, zirconium, hafnium, niobium, and tantalum have been the subject of considerable precursor development activity, owing to the importance of several mixed oxide phases and the importance of zirconium and hafnium oxide for high permittivity gate materials in microelectronics devices. Growth of metal nitride films of these elements has also been an active area of research for use as barrier materials in microelectronics devices. The deposition of copper metal films from metal‐organic precursors is driven by the urgent need for copper metallization procedures in microelectronics device manufacturing. The current state of metal‐organic precursor development is presented for each of the other metallic elements.

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Chemical vapor deposition of tantalum carbide and carbonitride thin films from Me3CETa(CH2CMe3)3 (E = CH, N)Electronic supplementary information (ESI) available: AFM and SEM images of TaC and TaCN films deposited on Si(100) at 773, 823 and 923 K. See http://www.rsc.org/suppdata/jm/b2/b208129f/

Cited by 23 publications

References 26 publications

Theranostic 2D Tantalum Carbide (MXene)

Theranostic 2D Tantalum Carbide (MXene)

Synthesis of Titanium(IV) Guanidinate Complexes and the Formation of Titanium Carbonitride via Low-Pressure Chemical Vapor Deposition

Metallic Materials Deposition: Metal‐Organic PrecursorsBased in part on the article Metallic Materials Deposition: Metal–Organic Precursors by Herbert D. Kaesz, Alfred Zinn, & Lutz Brandt which appeared in theEncyclopedia of Inorganic Chemistry, First Edition.

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