1994
DOI: 10.1002/9780470166420.ch3
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Chemical Vapor Deposition of Metal‐Containing Thin‐Film Materials from Organometallic Compounds

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Cited by 52 publications
(6 citation statements)
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“…The value of k 0 of a c4/a4 reaction of UL 2 (L ) 1, 2) is determined to be from 0.34 × 10 -3 (U2 2 on Pt) to 0.9-1.5 × 10 -2 cm s -1 (on GC). The order of the k 0 values are found to be similar to that of U(acac) 4 .…”
Section: Enhanced Stability and Et Kinetics Of Uo 2 L (L ) 1 2)mentioning
confidence: 57%
“…The value of k 0 of a c4/a4 reaction of UL 2 (L ) 1, 2) is determined to be from 0.34 × 10 -3 (U2 2 on Pt) to 0.9-1.5 × 10 -2 cm s -1 (on GC). The order of the k 0 values are found to be similar to that of U(acac) 4 .…”
Section: Enhanced Stability and Et Kinetics Of Uo 2 L (L ) 1 2)mentioning
confidence: 57%
“…The volatility and low-temperature clean decomposition of various transition metal β-diketonates, such as those of manganese­(III), make them suitable as metal organic chemical vapor deposition precursors . While there are many homometallic β-diketonates known as precursors for the preparation of oxide materials, heterometallic β-diketonato complexes are relatively rare . Zanello previously published the synthesis of various first row transition metal complexes of 1-ferrocenyl-1,3-butanedione, including the Mn­(III) complex [Mn­(FcCOCHCOCH 3 ) 3 ] ( 3b ) .…”
Section: Introductionmentioning
confidence: 99%
“…to form metal oxides and metal chalcogenides. 52,53 We also explored whether the second pathway might be operational or whether we could rule it out. The second pathway is indeed possible on thermodynamic grounds.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…First, two Cu­(hfac)­(vtms) molecules undergo the known metal-catalyzed disproportionation to form a Cu metal film, , and the volatile species Cu­(hfac) 2 and 2 vtms, according to reaction : Second, HBr may oxidize the copper metal up to Cu + , resulting in CuBr and a reduced species, such as H 2 , according to reaction : We believe the first pathway to be likely by analogy to the many metalorganic precursor reactions with vapors of Brønsted acids (H 2 O, H 2 S, etc.) to form metal oxides and metal chalcogenides. , We also explored whether the second pathway might be operational or whether we could rule it out. The second pathway is indeed possible on thermodynamic grounds.…”
Section: Results and Discussionmentioning
confidence: 99%