2011
DOI: 10.1021/am100901m
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Chemical Tailoring of Hybrid Sol−Gel Thick Coatings As Hosting Matrix for Functional Patterned Microstructures

Abstract: A phenyl-based hybrid organic - inorganic coating has been synthesized and processed by hard X-ray lithography. The overall lithography process is performed in a two-step process only (X-rays exposure and chemical etching). The patterns present high aspect ratio, sharp edges, and high homogeneity. The coating has been doped with a variety of polycyclic aromatic hydrocarbon functional molecules, such as anthracene, pentacene, and fullerene. For the first time, hard X-rays have been combined with thick hybrid fu… Show more

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Cited by 23 publications
(15 citation statements)
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References 33 publications
(47 reference statements)
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“…It is important to stress that DXRL is not limited by the diffraction of the patterning wavelength through the lithographic mask, as in the case of conventional UV lithography. 31 Moreover, it has been already reported that DXRL achieves extremely high aspect ratios on hybrid organic-inorganic films without a noticeable increase of the surface roughness in the patterned structure, 32 this feature makes the combination of EISA and DXRL a very powerful tool for fabrication of thick nanostructured lab-on-chip devices. The precision achieved through lithography is clearly visible in the panel (d) of Fig.…”
Section: Materials Fabricationmentioning
confidence: 99%
“…It is important to stress that DXRL is not limited by the diffraction of the patterning wavelength through the lithographic mask, as in the case of conventional UV lithography. 31 Moreover, it has been already reported that DXRL achieves extremely high aspect ratios on hybrid organic-inorganic films without a noticeable increase of the surface roughness in the patterned structure, 32 this feature makes the combination of EISA and DXRL a very powerful tool for fabrication of thick nanostructured lab-on-chip devices. The precision achieved through lithography is clearly visible in the panel (d) of Fig.…”
Section: Materials Fabricationmentioning
confidence: 99%
“…This technique enables a fast production of radicals within the porous matrix, and the radical species can be effectively used to chemically modify the film composition. The high penetration depth of X-ray radiation allows for a homogeneous effect in the matrix, even for several-micron thick films [22]. The protocol used for Ag NPs growth is resumed in the schematic of Fig.…”
Section: Resultsmentioning
confidence: 99%
“…According to previous experiments (Falcaro et al, 2011), the precursor sol was prepared adding 24 cm 3 of PhTES into a mixture of 48 cm 3 of toluene and 24 cm 3 of 2-propanol; after stirring for 10 min at reflux temperature ($ 343 K), 1.5 cm 3 of HCl 1 M was added dropwise. The sol was kept under stirring for 4.5 h in a flask under reflux conditions and then doped with different amounts of fullerene C 60 .…”
Section: Methodsmentioning
confidence: 99%