Chemical-state-resolved x-ray standing-wave analysis using chemical shift in photoelectron spectra

Adsorption height determination of nonequivalent C and O species of PTCDA on Ag(110) using x-ray standing waves

“…In the pioneering work of Sugiyama et al 9 XSW was used for the first time to locate atoms of the same element in different compounds, hence in different chemical environments. The basic idea was to exploit the corresponding chemical shifts and extract the structural information from the respective photoemission (PE) peaks.…”

A soft x-ray standing wave measurement system for analyzing compound semiconductor surfaces prepared by molecular beam epitaxy

“…Furthermore the goniometer system was also improved for the soft-XSW triangulation studies. [15][16][17][18] Figure 1 schematically shows a top view of the developed apparatus, which consists of the fast entry chamber ͑load-lock chamber͒, the transfer chamber, the MBE growth chamber, and the analysis chamber which is connected to NTT's synchrotron radiation beam line. Samples can be prepared in the MBE chamber, and transferred through the transfer chamber to the analysis chamber without being exposed to the air.…”

“…They can be mounted at an ICF-70 flange in the polarization direction of incident synchrotron radiation soft x rays. A hemispherical electron energy analyzer ͑CLAM2͒ for collecting Auger electrons or photoelectrons can be attached 17,18 instead of the fluorescent x-ray detectors.…”

“…4,5 Thus, several surface structure analyses utilizing backreflection XSW have been reported. 4,[6][7][8][9]12,17 On the other hand, we reported the feasibility of angle-scan soft-XSW experiments, in which high mechanical stability of the experimental setup is not required. [13][14][15] In the fabrication of advanced optoelectronic and monolithically integrated devices, it is important to understand and control the III-V compound semiconductor ͑001͒ surfaces and interfaces.…”

“…XSW using synchrotron radiation soft x rays has recently been carried out at various facilities. [3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18] When we use soft x rays as an incident beam, the larger cross sections of softer x rays for light-element atoms, such as Si and S, ensure higher emission intensity from monolayer-order quantities of these atoms, and photoelectrons and Auger electrons can be collected with sufficient statistics and energy resolution. Furthermore backreflection XSW, in which the incident photon energy of soft x rays is scanned instead of the incident angle, can be used for nonperfect substrate systems.…”