“…9 For the preparation of ceria thin films, several physical and chemical synthetic methods have been applied, for example, gas-phase methods such as pulsed laser deposition (PLD), 10,11 metal-organic chemical vapor deposition (MOCVD), 12,13 atomic layer deposition (ALD), 14−17 or solution-based methods. 18,19 In this context, chemical vapor deposition (CVD) is a versatile coating technique, which offers decisive advantages including conformal step coverage, large deposition area, and better controllability over material properties and composition. Use of plasma-enhanced deposition (PECVD) allows film preparation under nonequilibrium conditions, usually at low temperatures, which results in film characteristics that are not obtainable by other deposition techniques.…”