Chemical Processing of Materials on Silicon: More Functionality, Smaller Features, and Larger Wafers

Abstract

The invention of the transistor followed by more than 60 years of aggressive device scaling and process integration has enabled the global information web and subsequently transformed how people communicate and interact. The principles and practices built upon chemical processing of materials on silicon have been widely adapted and applied to other equally important areas, such as microfluidic systems for chemical and biological analysis and microscale energy storage solutions. The challenge of continuing these technological advances hinges on further improving the performance of individual devices and their interconnectivity while making the manufacturing processes economical, which is dictated by the materials' innate functionality and how they are chemically processed. In this review, we highlight challenges in scaling up the silicon wafers and scaling down the individual devices as well as focus on needs and challenges in the synthesis and integration of multifunctional materials.

The Fluid Joint: The Soft Spot of Micro‐ and Nanosystems

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Ambipolarity reduction in DMG asymmetric vacuum dielectric Schottky Barrier GAA MOSFET to improve hot carrier reliability

“…The donor type localized charges acts as a +ve localize charge. The generation of localized charges due to hot carriers depends on the instantaneous bias conditions [42]- [44]. Hence due to -ve localize charge the potential reduces and for +ve localized charge the value of surface potential increases.…”

Micro Nano Manufacturing Methods for Chemical, Gas and Bio Sensors, Water Purification and Energy Technologies

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