2001
DOI: 10.1002/1521-4095(200106)13:11%3c803::aid-adma806%3e3.0.co;2-w
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Chemical Nanolithography with Electron Beams

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Cited by 194 publications
(211 citation statements)
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“…Such processes can be both bond and site selective [2]. This selectivity is of high importance, e.g., in chemical lithography [3], nanofabrication [4,5] and for modification and functionalization of the surfaces [6,7]. Besides technological applications this specificity is relevant for radiation chemistry [8].…”
Section: Introductionmentioning
confidence: 64%
“…Such processes can be both bond and site selective [2]. This selectivity is of high importance, e.g., in chemical lithography [3], nanofabrication [4,5] and for modification and functionalization of the surfaces [6,7]. Besides technological applications this specificity is relevant for radiation chemistry [8].…”
Section: Introductionmentioning
confidence: 64%
“…13 While the decomposition and desorption processes prevail in aliphatic SAMs, cross linking is the dominant effect in the aromatic molecular layers, resulting in a quasipolymerization of the monomolecular film. [13][14][15][16][17][18][19] The schematic of cross-linked TP-DMT is shown in Fig. 5.…”
Section: Comparison Of the Electronic Structure Between Pristine Amentioning
confidence: 99%
“…[13][14][15][16][17][18][19] Such physical treatment leads to a quasipolymerization in aromatic thiol-derived SAMs and changes in electronic structure, 19 which we explore here in more detail for ͓1,1Ј;4Ј, 1Љ-terphenyl͔-4,4Љ-dimethanethiol ͑TPDMT͒. At issue is how the changes from an extra-molecular band structure to an intramolecular band structure ͑of the related quasipolymer͒ affect the dielectric properties.…”
Section: Introductionmentioning
confidence: 99%
“…A large part of the interest has focussed on aromatic moieties as an alternative of alkane-based spacers. [6][7][8][9][10][11] Aromatic SAMs differ significantly from the aliphatic ones in geometry and intermolecular interactions, so they show different charge-transfer properties [12][13][14] and different behaviour during electron irradiation. 15,16 Here, we are interested in SAMs containing spacers formed by biphenyl (BP) groups, and, in particular, in the modifications of the structures of these films after the dehydrogenization process induced by electron irradiation.…”
Section: Introductionmentioning
confidence: 99%